Inelastic-elastic properties of SiO2, SiO2 + TiO2 + ZrO2

2012 IEEE International Conference on Oxide Materials for Electronic Engineering (OMEE) Pub Date : 2012-09-01 DOI:10.1109/OMEE.2012.6464790

A. Onanko, M. Kulish, O. Lyashenko, G. Prodayvoda, S. Vyzhva, Y. Onanko

引用次数: 0

Abstract

A non-destructive method for the technological control of the structure defects in SiO2 + Si wafers by measuring the internal friction background difference on the nearby harmonics f1 and f2 after mechanical and heat treatments.

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SiO2、SiO2 + TiO2 + ZrO2的非弹弹性性能

通过测量机械和热处理后f1和f2附近谐波上的内摩擦背景差，提出了一种无损控制SiO2 + Si晶圆结构缺陷的工艺方法。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

2012 IEEE International Conference on Oxide Materials for Electronic Engineering (OMEE)

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