Application of optical spectral interferometry for thin film thickness measurement

Abstract

Preliminary results of the thin films thickness measurements using wideband radiation of a light-emitting diode (LED) and spectral interferometry method are presented. It has been shown that the measurement precision is not worse of that in commercially available low-coherence optical tomography devices, which are based on the same method. The LED applied has a broader spectrum and a much lower cost compared to those of super-luminescent diodes that usually used in optical spectral interferometry applications. Possibility of micro- and nano-range thickness optically transparent films has been validated with the suggested approach.