0.1 /spl mu/m RFCMOS on high resistivity substrates for system on chip (SOC) applications

Jau-Yuann Yang, Kamel Benaissa, D. Crenshaw, B. Williams, S. Sridhar, J. Ai, G. Boselli, Song Zhao, Shaoping Tang, N. Mahalingam, S. Ashburn, P. Madhani, T. Blythe, Hisashi Shichijo
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引用次数: 24

Abstract

This paper describes the impact of substrate resistivity on the key components of the radio frequency (RF) CMOS for the system on chip (SOC) applications. The comparison includes the transistor, inductor, capacitor, noise isolation, latch-up as well as the well-to-well isolation in a 0.1 /spl mu/m (physical gate length) CMOS technology.
用于片上系统(SOC)应用的高电阻率基板上的0.1 /spl mu/m RFCMOS
本文介绍了衬底电阻率对片上系统(SOC)应用中射频(RF) CMOS关键元件的影响。比较包括晶体管、电感、电容、噪声隔离、锁存以及在0.1 /spl mu/m(物理栅极长度)CMOS技术中的井对井隔离。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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CiteScore
4.50
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