Lithography Solutions for Submicron Panel-Level Packaging

Doug Shelton
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Abstract

Heterogeneous Integration of logic, memory, photonic, analog and other value-adding functions is one approach for increasing electronic system efficiency, performance and bandwidth while helping reduce overall manufacturing costs. To capitalize on Heterogeneous Integration benefits, designers are requiring finer resolution Redistribution Layer patterning and larger package sizes to maximize System-in-Package integration possibilities. Production of large-package electronics systems is well-suited for Panel Level Packaging (PLP) and achieving uniform submicron patterning across the entire rectangular panel is a key lithography challenge. To meet this challenge, Canon developed the first lithography exposure system or stepper that is capable of achieving submicron resolution on 500 mm panels. The stepper features a panel handling system for processing panels up to 515 mm x 515 mm in size and is also equipped with wide-field projection lens featuring a maximum 0.24 Numerical Aperture and a large 52 mm x 68 mm image field. This paper will report on evaluation results for a submicron PLP process using the panel stepper and will introduce high-resolution PLP process challenges including warped panel handling. Process results on Copper Clad Laminate (CCL) substrates will be reported including pattern uniformity, adjacent shot stitching accuracy and overlay accuracy on substrates containing die-placement error that is common in Fan-Out processes.
亚微米板级封装的光刻解决方案
逻辑、存储、光子、模拟和其他增值功能的异构集成是提高电子系统效率、性能和带宽的一种方法,同时有助于降低总体制造成本。为了充分利用异构集成的好处,设计人员需要更精细的再分配层模式和更大的封装尺寸,以最大限度地实现系统中封装集成的可能性。大封装电子系统的生产非常适合面板级封装(PLP),在整个矩形面板上实现均匀的亚微米图案是光刻技术的关键挑战。为了应对这一挑战,佳能开发了第一个光刻曝光系统或步进系统,能够在500毫米面板上实现亚微米分辨率。该步进机具有面板处理系统,可处理尺寸为515 mm x 515 mm的面板,还配备了具有最大0.24数值孔径和大52 mm x 68 mm图像场的宽视场投影镜头。本文将报告使用面板步进器的亚微米PLP工艺的评估结果,并将介绍高分辨率PLP工艺挑战,包括翘曲面板处理。将报告覆铜层压板(CCL)基板上的工艺结果,包括图案均匀性、相邻镜头拼接精度和包含扇出工艺中常见的模具放置误差的基板上的覆盖精度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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