Effect of interfacial phonon-plasmon modes on electrical transport in supported graphene

Z. Ong, M. Fischetti
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Abstract

This paper discusses the effects of interfacial phonon-plasmon modes on electrical transport in supported graphene. The mobility in graphene supported on an insulating dielectric substrate (such as SiO2) is typically due to scattering by charged impurities, surface roughness and surface polar phonon (SPP) modes. Although impurity scattering is the dominant factor limiting electron mobility it can be reduced experimentally. Coupling between the SPP and graphene plasmon modes leads to the formation of interfacial phonon-plasmon (lPP) modes which can also be interpreted as screened SPP modes. IPP dispersion and electron-IPP scattering rates were used for different substrates (SiO2, h-BN, HfO2 and Al2O3) to calculate the substrate-limited conductivity and field mobility of supported graphene.
界面声子-等离子体模式对负载石墨烯中电输运的影响
本文讨论了界面声子-等离子体模式对负载石墨烯中电输运的影响。在绝缘介质衬底(如SiO2)上支撑的石墨烯中的迁移率通常是由于带电杂质、表面粗糙度和表面极性声子(SPP)模式的散射。虽然杂质散射是限制电子迁移率的主要因素,但它可以通过实验降低。SPP和石墨烯等离子体模式之间的耦合导致界面声子-等离子体(lPP)模式的形成,这种模式也可以解释为筛选的SPP模式。利用不同衬底(SiO2, h-BN, HfO2和Al2O3)的IPP色散和电子-IPP散射率来计算负载石墨烯的衬底限制电导率和场迁移率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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