{"title":"Study of Silicon Controlled Rectifier Devices with Different Dimensions for ESD Protection","authors":"Yize Wang, Junmin He, Y. Hu, Yubo Wang, Yuan Wang","doi":"10.1109/ICSICT49897.2020.9278319","DOIUrl":null,"url":null,"abstract":"This work mainly shows the impact of dimension changes of silicon controlled rectifier (SCR) devices on ESD protection. Based on 110-nm technology node, the key parameters D1, D2, and D3 of SCR device are variable to obtain the relevant measurement. Further, the detail analysis from the perspective of high-voltage application for these measured results are summarized in this work.","PeriodicalId":6727,"journal":{"name":"2020 IEEE 15th International Conference on Solid-State & Integrated Circuit Technology (ICSICT)","volume":"3 1","pages":"1-3"},"PeriodicalIF":0.0000,"publicationDate":"2020-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE 15th International Conference on Solid-State & Integrated Circuit Technology (ICSICT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICSICT49897.2020.9278319","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
This work mainly shows the impact of dimension changes of silicon controlled rectifier (SCR) devices on ESD protection. Based on 110-nm technology node, the key parameters D1, D2, and D3 of SCR device are variable to obtain the relevant measurement. Further, the detail analysis from the perspective of high-voltage application for these measured results are summarized in this work.