Correlation between plasma pinch intensity, current sheath symmetry, and HXR yield by APF plasma focus device

R. Amrollahi, M. Habibi, S. Shahshenas
{"title":"Correlation between plasma pinch intensity, current sheath symmetry, and HXR yield by APF plasma focus device","authors":"R. Amrollahi, M. Habibi, S. Shahshenas","doi":"10.1080/10519990802646104","DOIUrl":null,"url":null,"abstract":"In this paper, we study the effect of current sheath symmetry on pinched plasma intensity in Amirkabir Plasma Focus (APF) facility (16 kV, 36 μ f and 115 nH) by the magnetic probes. The arrival times of current sheath reaching to the probes, the signals of hard X-ray (HXR) and also discharge current signal are recorded simultaneously. The simulated trajectory, velocity and intensity of current sheath are compared with the experimental results. There seems to be a good accordance among current sheath symmetry, pinched plasma intensity and HXR yield.","PeriodicalId":54600,"journal":{"name":"Plasma Devices and Operations","volume":"27 1","pages":"1 - 7"},"PeriodicalIF":0.0000,"publicationDate":"2009-02-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasma Devices and Operations","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1080/10519990802646104","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

In this paper, we study the effect of current sheath symmetry on pinched plasma intensity in Amirkabir Plasma Focus (APF) facility (16 kV, 36 μ f and 115 nH) by the magnetic probes. The arrival times of current sheath reaching to the probes, the signals of hard X-ray (HXR) and also discharge current signal are recorded simultaneously. The simulated trajectory, velocity and intensity of current sheath are compared with the experimental results. There seems to be a good accordance among current sheath symmetry, pinched plasma intensity and HXR yield.
等离子体夹紧强度、电流鞘层对称性与APF等离子体聚焦装置HXR产率的相关性
在Amirkabir等离子体聚焦(APF)装置(16 kV, 36 μ f, 115 nH)中,利用磁探针研究了电流鞘层对称性对压缩等离子体强度的影响。同时记录电流护套到达探针的时间、硬x射线(HXR)信号和放电电流信号。仿真结果与实验结果进行了比较。电流鞘层对称性、压缩等离子体强度和HXR产率之间似乎有很好的一致性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
Plasma Devices and Operations
Plasma Devices and Operations 物理-核科学技术
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信