A. Tyagi, U. Breuer, H. Holzbrecher, J. Becker, H. Dietze, L. Kappius, H. Bay, S. Mantl
{"title":"The influence of an epitaxial CoSi2 layer on diffusion of B and Sb in underlying Si during oxidation","authors":"A. Tyagi, U. Breuer, H. Holzbrecher, J. Becker, H. Dietze, L. Kappius, H. Bay, S. Mantl","doi":"10.1007/S002160051489","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":12375,"journal":{"name":"Fresenius' Journal of Analytical Chemistry","volume":"66 1","pages":"282-285"},"PeriodicalIF":0.0000,"publicationDate":"1999-09-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Fresenius' Journal of Analytical Chemistry","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1007/S002160051489","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}