The influence of an epitaxial CoSi2 layer on diffusion of B and Sb in underlying Si during oxidation

A. Tyagi, U. Breuer, H. Holzbrecher, J. Becker, H. Dietze, L. Kappius, H. Bay, S. Mantl
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引用次数: 1
氧化过程中外延CoSi2层对下伏Si中B和Sb扩散的影响
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