Unijunction Transistor on Silicon-On-Insulator Substrate

Yx Chen, J. Liu, K. Xiao, A. Zaslavsky, S. Cristoloveanu, F. Liu, BH. Li, B. Li, J. Wan
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引用次数: 0

Abstract

A unijunction transistor based on fully-depleted silicon-on-insulator substrate is proposed. The device structure is similar to a junction field effect transistor. By conducting the TCAD simulation, we observe sharp switching and large hysteresis in emitter current-emitter voltage curves with the turn-on voltage linearly controlled by the second base voltage. The operation of the device is mainly determined by the emitter-channel PN junction, which is induced by the backgate voltage. The impact of the backgate voltage on the electrical characteristics is analyzed by changes in the channel potential.
绝缘体上硅衬底单结晶体管
提出了一种基于全耗尽绝缘体上硅衬底的单结晶体管。器件结构类似于结型场效应晶体管。通过TCAD仿真,我们观察到在导通电压由第二基极电压线性控制的情况下,发射极电流-发射极电压曲线出现了剧烈的开关和大的滞后。器件的工作主要由发射-沟道PN结决定,该PN结由后门电压感应产生。通过通道电位的变化分析了后门电压对电特性的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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