{"title":"Bulk-etching behaviour of Kapton and Thermalimide track detectors","authors":"S.K. Chakarvarti, S.K. Mahna","doi":"10.1016/1359-0189(92)90009-K","DOIUrl":null,"url":null,"abstract":"<div><p>Polyimides and polyetherimides have recently been recognized as materials with unique properties which are essential for the production of more efficient and useful nuclear track filters. We report here the bulk-etch characteristics of Kapton-H (polyimide) and Thermalimide foils using etchants NaOCl (4% Cl w/v) and NaOCl + ethanol (1:1) at different temperatures and under ambient light and dark conditions, with and without stirring. The activation energy values for etching are also reported.</p></div>","PeriodicalId":81549,"journal":{"name":"International Journal Of Radiation Applications And Instrumentation. Part D, Nuclear Tracks And Radiation Measurements","volume":"20 4","pages":"Pages 589-594"},"PeriodicalIF":0.0000,"publicationDate":"1992-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/1359-0189(92)90009-K","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal Of Radiation Applications And Instrumentation. Part D, Nuclear Tracks And Radiation Measurements","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/135901899290009K","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
Abstract
Polyimides and polyetherimides have recently been recognized as materials with unique properties which are essential for the production of more efficient and useful nuclear track filters. We report here the bulk-etch characteristics of Kapton-H (polyimide) and Thermalimide foils using etchants NaOCl (4% Cl w/v) and NaOCl + ethanol (1:1) at different temperatures and under ambient light and dark conditions, with and without stirring. The activation energy values for etching are also reported.