Sensitization of track etching in CR-39 by copolymerization with methacryloyl-L-alanine methyl ester

International Journal Of Radiation Applications And Instrumentation. Part D, Nuclear Tracks And Radiation Measurements Pub Date : 1992-10-01 DOI:10.1016/1359-0189(92)90002-D

Masao Tamada, Masaru Yoshida, Masaharu Asano, Hideki Omichi, Ryoichi Katakal, Christine Trautmann, Johann Vetter, Reimar Shohr

{"title":"Sensitization of track etching in CR-39 by copolymerization with methacryloyl-L-alanine methyl ester","authors":"Masao Tamada, Masaru Yoshida, Masaharu Asano, Hideki Omichi, Ryoichi Katakal, Christine Trautmann, Johann Vetter, Reimar Shohr","doi":"10.1016/1359-0189(92)90002-D","DOIUrl":null,"url":null,"abstract":"<div>Copolymer films of diethyleneglycol-bis-allylcarbonate (monomer of CR-39) and selected volume percentages of methacryloyl-L-alanine methyl ester (MA-L-AlaOMe) between 5 and 60% were irradiated with Au ions of 13 MeV nucl-1 and etched in NaOH solution at 60°C. Sensitization of track etching was observed for NaOH concentrations of 4 and 6 N. The maximum reduced etch-rate ratio, Vt/Vb-1, was obtained for the copolymer of 90% of CR-39 monomer and 10% of MA-L-AlaOMe at 4 N NaOH, which was 3.6 times higher than that for pure CR-39. The sensitization was accompanied by an increase in Vb so that the etching time could be reduced to ca 1/30 in comparison with that for pure CR-39.</div>","PeriodicalId":81549,"journal":{"name":"International Journal Of Radiation Applications And Instrumentation. Part D, Nuclear Tracks And Radiation Measurements","volume":"20 4","pages":"Pages 543-547"},"PeriodicalIF":0.0000,"publicationDate":"1992-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/1359-0189(92)90002-D","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal Of Radiation Applications And Instrumentation. Part D, Nuclear Tracks And Radiation Measurements","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/135901899290002D","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 1

Abstract

Copolymer films of diethyleneglycol-bis-allylcarbonate (monomer of CR-39) and selected volume percentages of methacryloyl-L-alanine methyl ester (MA-L-AlaOMe) between 5 and 60% were irradiated with Au ions of 13 MeV nucl^-1 and etched in NaOH solution at 60°C. Sensitization of track etching was observed for NaOH concentrations of 4 and 6 N. The maximum reduced etch-rate ratio, V_t/V_b-1, was obtained for the copolymer of 90% of CR-39 monomer and 10% of MA-L-AlaOMe at 4 N NaOH, which was 3.6 times higher than that for pure CR-39. The sensitization was accompanied by an increase in V_b so that the etching time could be reduced to ca 1/30 in comparison with that for pure CR-39.

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甲基丙烯酰丙氨酸甲酯共聚对CR-39中径迹蚀刻的增感作用

用13MeV核-1的Au离子照射二甘醇双烯丙基碳酸酯（CR-39单体）和选定体积百分比在5和60%之间的甲基丙烯酰基-L-丙氨酸甲酯（MA-L-AlaOMe）的共聚物膜，并在60°C的NaOH溶液中蚀刻。当NaOH浓度为4和6N时，观察到轨迹蚀刻的增敏作用。在4N的NaOH下，90%的CR-39单体和10%的MA-L-AlaOMe的共聚物获得了最大的降低蚀刻速率比Vt/Vb-1，这是纯CR-39的3.6倍。增敏伴随着Vb的增加，因此与纯CR-39相比，蚀刻时间可以减少到约1/30。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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International Journal Of Radiation Applications And Instrumentation. Part D, Nuclear Tracks And Radiation Measurements

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