{"title":"Effect of an ultrasonic field on etched track formation in dielectric nuclear track detectors","authors":"S.V. Elkin, V.V. Kushin, V.K. Lyapidevsky, N.B. Khokhlov","doi":"10.1016/1359-0189(92)90048-Z","DOIUrl":null,"url":null,"abstract":"<div><p>The method for developing charged-particle tracks in dielectric nuclear track detectors by etching in an alkaline solution under the effect of an ultrasonic field is examined. The parameters of the particle tracks thus exposed differ substantially from those obtained by conventional chemical etching. The ultrasonic field has been shown to improve the etching selectivity of tracks in a detector. The dependence of the etching velocity in the ultrasonic field on various parameters are studied. A probable explanation for the found effect is given.</p></div>","PeriodicalId":81549,"journal":{"name":"International Journal Of Radiation Applications And Instrumentation. Part D, Nuclear Tracks And Radiation Measurements","volume":"20 2","pages":"Pages 267-271"},"PeriodicalIF":0.0000,"publicationDate":"1992-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/1359-0189(92)90048-Z","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal Of Radiation Applications And Instrumentation. Part D, Nuclear Tracks And Radiation Measurements","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/135901899290048Z","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
The method for developing charged-particle tracks in dielectric nuclear track detectors by etching in an alkaline solution under the effect of an ultrasonic field is examined. The parameters of the particle tracks thus exposed differ substantially from those obtained by conventional chemical etching. The ultrasonic field has been shown to improve the etching selectivity of tracks in a detector. The dependence of the etching velocity in the ultrasonic field on various parameters are studied. A probable explanation for the found effect is given.