Monolayered Silicon and Germanium Monopnictide Semiconductors: Excellent Stability, High Absorbance, and Strain Engineering of Electronic Properties

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Ai-Qiang Cheng, Zi He, Jun Zhao, Hui Zeng*, Ru-Shan Chen*
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引用次数: 75

Abstract

The discovery of stable two-dimensional (2D) semiconductors with exotic electronic properties is crucial to the future electronic technologies. Using the first-principles calculations, we predict the monolayered Silicon- and Germanium-monopnictides as a new class of semiconductors owning excellent dynamical and thermal stabilities, prominent anisotropy, and high possibility of experimental exfoliation. These semiconductors, including the monolayered SiP, SiAs, GeP, and GeAs, possess wide bandgaps of 2.08–2.64 eV obtained by hybrid functional calculation. Under small uniaxial strains (?2 to 3%), dramatic modulations of their band structures are observed, and furthermore, all the 2D monolayers (MLs) can be transformed between indirect and direct semiconductors. The monolayered GeAs and SiP exhibits extraordinary optical absorption in the range of visible and ultraviolet (UV) light spectra, respectively. The exfoliation energies of these monolayers are comparable to graphene, implying a strong probability of successful fabrication by mechanical exfoliation. These intriguing properties of the monolayered silicon- and germanium-monopnictides, combined with their highly stable structures, offer tremendous opportunities for electronic and optoelectronic devices working under UV–visible spectrum.

Abstract Image

单层硅和锗单晶半导体:优异的稳定性、高吸光度和电子特性的应变工程
具有奇异电子特性的稳定二维半导体的发现对未来的电子技术至关重要。利用第一性原理计算,我们预测单层硅和锗单晶半导体具有优异的动力学和热稳定性,突出的各向异性和高的实验剥离可能性。这些半导体,包括单层SiP, SiAs, GeP和GeAs,具有2.08-2.64 eV的宽带隙。在小的单轴应变(?2 ~ 3%),观察到它们的能带结构发生了剧烈的调制,而且所有的二维单层(MLs)都可以在间接和直接半导体之间转换。单层GeAs和SiP分别在可见光和紫外光谱范围内表现出非凡的光吸收。这些单层的剥落能与石墨烯相当,这意味着通过机械剥落成功制造的可能性很大。单层硅和锗单核苷酸的这些有趣的特性,加上它们高度稳定的结构,为在紫外可见光谱下工作的电子和光电子器件提供了巨大的机会。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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