Highly Photocatalytically Active Iron(III) Titanium Oxide Thin films via Aerosol-Assisted CVD†

Sanjayan Sathasivam, Davinder S. Bhachu, Yao Lu, Salem M. Bawaked, Abdullah Y. Obaid, Shaeel Al-Thabaiti, Sulaiman N. Basahel, Claire J. Carmalt, Ivan P. Parkin
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引用次数: 8

Abstract

This paper presents, for the first time, the synthesis, via aerosol-assisted (AA)CVD followed by annealing at 620 °C for 5 h, of pure Fe2TiO5 thin films on glass. The thin film is deposited from a one pot solution containing titanium isopropoxide and tris(acetylacetonato)iron in an ethyl acetate solvent. The film is characterized using a range of techniques including powder X-ray diffraction(XRD), wavelength dispersive X-ray (WDX) spectroscopy, X-ray photoelectron spectroscopy(XPS), scanning electron microscopy (SEM), and UV-vis spectroscopy. The photocatalytic activity of the film under UVA and visible light irradiation is also tested. The results show that Fe2TiO5 is able to degrade resazurin redox dye under UVA illumination at a rate much higher than Pilkington NSG ActivTM, with a formal quantum efficiency (FQE) an order of magnitude superior.

气溶胶辅助CVD法制备高光催化活性的氧化铁(III)钛薄膜
本文首次采用气溶胶辅助气相沉积法(AA)在620℃下退火5 h,在玻璃表面合成了纯Fe2TiO5薄膜。薄膜是由含有异丙醇钛和三(乙酰丙酮)铁的一锅溶液在乙酸乙酯溶剂中沉积而成的。使用一系列技术对薄膜进行表征,包括粉末x射线衍射(XRD),波长色散x射线(WDX)光谱,x射线光电子能谱(XPS),扫描电子显微镜(SEM)和紫外可见光谱。并测试了膜在UVA和可见光照射下的光催化活性。结果表明,在UVA光照下,Fe2TiO5降解reazurin氧化还原染料的速率远高于Pilkington NSG ActivTM,且形式量子效率(FQE)高出一个数量级。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Chemical Vapor Deposition
Chemical Vapor Deposition 工程技术-材料科学:膜
自引率
0.00%
发文量
0
审稿时长
>12 weeks
期刊介绍: Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.
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