{"title":"Analysis of quantum confinement in nanosheet FETs by using a quantum drift diffusion model","authors":"Masashi Matsuda, Akira Hiroki","doi":"10.1002/ecj.12394","DOIUrl":null,"url":null,"abstract":"<p>In this paper, we have analyzed quantum confinement effects in nanosheet MOSFETs by using a quantum drift-diffusion (QDD) model. The QDD model is a device simulator which allows to simulate quantum confinement effects in the inversion layer for advanced MOSFETs. The quantum confinement effects in nanosheets have been analyzed by comparing the simulation results by QDD and drift-diffusion (DD) model. The drain current ratio of DD to QDD is 250.1% at VG = 0.5 V and 180.1% at VG = 0 V. While the maximum electron density of DD exists at the interface between the insulator and the silicon sheet, that of QDD goes to near the center of the silicon sheet. The electron areal density ratio of DD to QDD is 118.3% in the direction of the 10 nm width of the silicon sheet and 176.9% in the direction of the 4 nm width.</p>","PeriodicalId":50539,"journal":{"name":"Electronics and Communications in Japan","volume":"106 1","pages":""},"PeriodicalIF":0.5000,"publicationDate":"2023-02-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electronics and Communications in Japan","FirstCategoryId":"5","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/ecj.12394","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
In this paper, we have analyzed quantum confinement effects in nanosheet MOSFETs by using a quantum drift-diffusion (QDD) model. The QDD model is a device simulator which allows to simulate quantum confinement effects in the inversion layer for advanced MOSFETs. The quantum confinement effects in nanosheets have been analyzed by comparing the simulation results by QDD and drift-diffusion (DD) model. The drain current ratio of DD to QDD is 250.1% at VG = 0.5 V and 180.1% at VG = 0 V. While the maximum electron density of DD exists at the interface between the insulator and the silicon sheet, that of QDD goes to near the center of the silicon sheet. The electron areal density ratio of DD to QDD is 118.3% in the direction of the 10 nm width of the silicon sheet and 176.9% in the direction of the 4 nm width.
期刊介绍:
Electronics and Communications in Japan (ECJ) publishes papers translated from the Transactions of the Institute of Electrical Engineers of Japan 12 times per year as an official journal of the Institute of Electrical Engineers of Japan (IEEJ). ECJ aims to provide world-class researches in highly diverse and sophisticated areas of Electrical and Electronic Engineering as well as in related disciplines with emphasis on electronic circuits, controls and communications. ECJ focuses on the following fields:
- Electronic theory and circuits,
- Control theory,
- Communications,
- Cryptography,
- Biomedical fields,
- Surveillance,
- Robotics,
- Sensors and actuators,
- Micromachines,
- Image analysis and signal analysis,
- New materials.
For works related to the science, technology, and applications of electric power, please refer to the sister journal Electrical Engineering in Japan (EEJ).