Nano indentation studies on ceramic thinfilms coatings deposited using sputtering process for energy applications

Q1 Materials Science

Materials Science for Energy Technologies Pub Date : 2023-08-20 DOI:10.1016/j.mset.2023.08.001

Vijaya G. , Muralidhar Singh M. , Manish Kumar , Amit Kumar , Ashok Kumar M.S. , Dheeraj Kumar , Shatrudhan Pandey , S.M. Mozammil Hasnain , Abhishek Kumar Singh , Gaurav Kumar

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Abstract

Nanoindentation technique is generally used for measuring thinfilm mechanical properties such as hardness, modulus and stiffness. Nanoindentation of ceramic thinfilms of SiO_2, Si₃N₄ and Al₂O₃ was deposited by radio-frequency (RF) magnetron sputtering on the stainless steel (SS304) substrates using a nanoindenter. Under varied sputtering conditions, the “as-deposited” film was amorphous. The as-deposited thin film had a thickness of 200 nm. The amorphous film was loaded/unloaded only once while operating in load control mode. Hardness and Young's modulus, two mechanical properties of the ceramic thinfilms, were also measured. When SiO₂, Si₃N₄, and Al₂O₃ thinfilms are deposited onto stainless steel substrates using an RF magnetron sputtering, the roughness of the ceramic thinfilms is in the range of 8 to 12 nm. The nanoindentation results were compared, the hardness of the coatings is in the range of 6 to 9 GPa, and these ceramic coatings can be used as an adhesive layer for multilayer thin film coating.

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用于能源应用的溅射沉积陶瓷薄膜涂层的纳米压痕研究

纳米压痕技术通常用于测量薄膜的机械性能，如硬度、模量和刚度。使用纳米压头通过射频（RF）磁控溅射在不锈钢（SS304）衬底上沉积SiO2、Si3N4和Al2O3陶瓷薄膜的纳米压痕。在不同的溅射条件下，“沉积态”薄膜是非晶态的。所沉积的薄膜具有200nm的厚度。在负载控制模式下操作时，非晶膜仅被加载/卸载一次。测定了陶瓷薄膜的硬度和杨氏模量两项力学性能。当使用RF磁控溅射将SiO2、Si3N4和Al2O3薄膜沉积到不锈钢衬底上时，陶瓷薄膜的粗糙度在8-12nm的范围内。对纳米压痕结果进行了比较，涂层的硬度在6至9GPa的范围内，这些陶瓷涂层可以用作多层薄膜涂层的粘合层。

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