Progress and roadmap for graphene films in electromagnetic interference shielding

Dengguo Lai , Zhaohui Chen , Zhennan Han , Zhong-Shuai Wu , Xiaoxiao Chen
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引用次数: 6

Abstract

Graphene films (GFs) featured with exceptional electrical property and macroscopic ultrathin two-dimensional structure demonstrate infinite potentials for electromagnetic interference shielding applications. By retrospecting the advanced achievements of GF-type shielding materials over the past decades, this review aims to provide a roadmap driven by the great progress and inspire future disruptive innovations. The fabrication methods of GFs are systematically discussed, with a particular emphasis on creative approaches. Strategies to optimize the shielding performance are elaborated in terms of manufacturing methods, shielding efficiency and properties, corresponding mechanisms, challenges and perspectives. Likewise, advancements of multifunctional GFs simultaneously satisfying electromagnetic shielding with thermal dissipation or transparent requirements are outlined. Using history as a mirror, a clear insight into this rapidly growing field is given, and corresponding current challenges and future opportunities in the fabrication and application of GF-family shielding materials are highlighted and envisioned. We hope this review can encourage further innovations in this exciting branch of research and inspire scientists from both academia and industry to promote revolutionary breakthroughs in GF-shields for next-generation shielding applications.

Abstract Image

石墨烯薄膜在电磁干扰屏蔽中的研究进展与发展方向
石墨烯薄膜具有优异的电学性能和宏观超薄二维结构,在电磁干扰屏蔽应用中表现出无限的潜力。通过回顾GF型屏蔽材料在过去几十年中的先进成就,本综述旨在提供一个由巨大进步驱动的路线图,并激励未来的颠覆性创新。系统地讨论了GFs的制造方法,特别强调了创造性的方法。从制造方法、屏蔽效率和性能、相应的机制、挑战和前景等方面阐述了优化屏蔽性能的策略。同样,概述了同时满足具有散热或透明要求的电磁屏蔽的多功能GFs的进展。以史为鉴,对这一快速发展的领域有了清晰的认识,并强调和展望了GF家族屏蔽材料制造和应用方面的当前挑战和未来机遇。我们希望这篇综述能鼓励这一令人兴奋的研究领域的进一步创新,并激励学术界和工业界的科学家推动下一代屏蔽应用中GF屏蔽的革命性突破。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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CiteScore
4.20
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