{"title":"Photoelectron spectroscopy of ceria: Reduction, quantification and the myth of the vacancy peak in XPS analysis","authors":"David J. Morgan","doi":"10.1002/sia.7254","DOIUrl":null,"url":null,"abstract":"Primarily due to its inherent redox chemistry, ceria (CeO2) is of use in many diverse areas of research. However, there is a wealth of misinterpretation of the oxygen spectra when discussing the result of damage or reduction to the CeO2 lattice, especially with regard to a signal in this region attributed to oxygen vacancies. In this paper, it is shown that this peak cannot be due to vacancies and that a better understanding of the changes in stoichiometry of CeO2 is best viewed from that of the Ce(III) component when considered in tandem with the O 1s signal.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":null,"pages":null},"PeriodicalIF":1.6000,"publicationDate":"2023-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface and Interface Analysis","FirstCategoryId":"92","ListUrlMain":"https://doi.org/10.1002/sia.7254","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 4
Abstract
Primarily due to its inherent redox chemistry, ceria (CeO2) is of use in many diverse areas of research. However, there is a wealth of misinterpretation of the oxygen spectra when discussing the result of damage or reduction to the CeO2 lattice, especially with regard to a signal in this region attributed to oxygen vacancies. In this paper, it is shown that this peak cannot be due to vacancies and that a better understanding of the changes in stoichiometry of CeO2 is best viewed from that of the Ce(III) component when considered in tandem with the O 1s signal.
期刊介绍:
Surface and Interface Analysis is devoted to the publication of papers dealing with the development and application of techniques for the characterization of surfaces, interfaces and thin films. Papers dealing with standardization and quantification are particularly welcome, and also those which deal with the application of these techniques to industrial problems. Papers dealing with the purely theoretical aspects of the technique will also be considered. Review articles will be published; prior consultation with one of the Editors is advised in these cases. Papers must clearly be of scientific value in the field and will be submitted to two independent referees. Contributions must be in English and must not have been published elsewhere, and authors must agree not to communicate the same material for publication to any other journal. Authors are invited to submit their papers for publication to John Watts (UK only), Jose Sanz (Rest of Europe), John T. Grant (all non-European countries, except Japan) or R. Shimizu (Japan only).