Surface activation of thin polyvinyl alcohol films by atmospheric pressure plasma jet: Influence of electron temperature

IF 2.9 3区 物理与天体物理 Q2 PHYSICS, APPLIED
Prajwal Lamichhane, T. Acharya, Jaewoo Park, Kirubel Amsalu, B. Park, Eun-Ha Choi
{"title":"Surface activation of thin polyvinyl alcohol films by atmospheric pressure plasma jet: Influence of electron temperature","authors":"Prajwal Lamichhane, T. Acharya, Jaewoo Park, Kirubel Amsalu, B. Park, Eun-Ha Choi","doi":"10.1002/ppap.202300102","DOIUrl":null,"url":null,"abstract":"This study investigates the effects of nonthermal plasma characteristics on surface treatments of polyvinyl alcohol with various diagnostics such as Raman spectroscopy, work of adhesion, optical emission spectroscopy, and current–voltage measurements. Our findings demonstrate the importance of controlling the plasma's electron temperature and density to achieve the desired surface treatment outcomes. We show that plasma jets with varying electron temperatures are more appropriate for different surface treatments, with high electron temperatures than 1.1 eV suitable for functional group (C═O) insertion abiding macro‐scale surface roughness and low electron temperatures for plasma etching, which increased surface roughness significantly. Plasma electron temperatures between 1.1 and 1.3 eV are best for treatment as higher ones cause bond breaking while lower ones would etch the surface.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":" ","pages":""},"PeriodicalIF":2.9000,"publicationDate":"2023-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasma Processes and Polymers","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1002/ppap.202300102","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
引用次数: 1

Abstract

This study investigates the effects of nonthermal plasma characteristics on surface treatments of polyvinyl alcohol with various diagnostics such as Raman spectroscopy, work of adhesion, optical emission spectroscopy, and current–voltage measurements. Our findings demonstrate the importance of controlling the plasma's electron temperature and density to achieve the desired surface treatment outcomes. We show that plasma jets with varying electron temperatures are more appropriate for different surface treatments, with high electron temperatures than 1.1 eV suitable for functional group (C═O) insertion abiding macro‐scale surface roughness and low electron temperatures for plasma etching, which increased surface roughness significantly. Plasma electron temperatures between 1.1 and 1.3 eV are best for treatment as higher ones cause bond breaking while lower ones would etch the surface.

Abstract Image

常压等离子体喷射对聚乙烯醇薄膜表面活化的影响
本研究通过拉曼光谱、粘附功、光学发射光谱和电流-电压测量等多种诊断方法研究了非热等离子体特性对聚乙烯醇表面处理的影响。我们的研究结果证明了控制等离子体的电子温度和密度对于实现预期的表面处理结果的重要性。我们发现具有不同电子温度的等离子体射流更适合于不同的表面处理,高于1.1 eV的高电子温度适合于官能团(C = O)插入,保持宏观表面粗糙度,而低电子温度用于等离子体蚀刻,这显着增加了表面粗糙度。等离子体电子温度在1.1 ~ 1.3 eV之间最适合处理,较高的温度会导致键断裂,较低的温度会腐蚀表面。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
Plasma Processes and Polymers
Plasma Processes and Polymers 物理-高分子科学
CiteScore
6.60
自引率
11.40%
发文量
150
审稿时长
3 months
期刊介绍: Plasma Processes & Polymers focuses on the interdisciplinary field of low temperature plasma science, covering both experimental and theoretical aspects of fundamental and applied research in materials science, physics, chemistry and engineering in the area of plasma sources and plasma-based treatments.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信