Photoresists based on bisphenol A derivatives with tert-butyl ester groups for electron beam lithography

IF 4.1 3区化学 Q2 CHEMISTRY, PHYSICAL

Journal of Photochemistry and Photobiology A-chemistry Pub Date : 2023-03-01 DOI:10.1016/j.jphotochem.2022.114351

Shengwen Hu , Jinping Chen , Tianjun Yu , Yi Zeng , Xudong Guo , Shuangqing Wang , Guoqiang Yang , Yi Li

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引用次数: 1

Abstract

Four branched bisphenol A derivatives decorated with tert-butyl ester group (BPA-BU-n, n = 1–4) were synthesized. The number of BU groups was controlled precisely by selective hydrogenation. The good thermal resistance and film-forming performance suggested that BPA-BU-1 and BPA-BU-2 are candidates for photoresist materials. They were used as positive-tone photoresists by mixing with a proportionate photo-acid generator and base. Both BPA-BU-1 and BPA-BU-2 resists can obtain 40 nm L/S patterns. BPA-BU-1 resist exhibits higher sensitivity and contrast than that of BPA-BU-2 resist for their different substituted positions of acid labile groups in the molecule. All the results demonstrated that protected ratio and position had a significant effect on the patterning ability of BPA-BUs resists. This study will help to understand the relationship between molecular structures and lithographic performance, and provide useful guidelines for designing molecular resists.

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基于叔丁基双酚A衍生物的电子束光刻光刻光刻胶

合成了四种叔丁基酯修饰的支链双酚A衍生物（BPA-BU-n，n=1-4）。BU基团的数量通过选择性氢化来精确控制。良好的耐热性和成膜性能表明，BPA-BU-1和BPA-BU-2是光致抗蚀剂材料的候选者。通过与成比例的光致酸发生器和碱混合，它们被用作正色调光致抗蚀剂。BPA-BU-1和BPA-BU-2抗蚀剂都可以获得40nm的L/S图案。BPA-BU-1抗蚀剂表现出比BPA-BU-2抗蚀剂更高的灵敏度和对比度，因为它们在分子中的酸不稳定基团的不同取代位置。所有结果表明，保护比例和位置对BPA-BUs抗蚀剂的图案化能力有显著影响。这项研究将有助于理解分子结构与光刻性能之间的关系，并为设计分子抗蚀剂提供有用的指导。

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来源期刊

Journal of Photochemistry and Photobiology A-chemistry 化学-物理化学

CiteScore

7.90

自引率

7.00%

发文量

580

审稿时长

48 days

期刊介绍： JPPA publishes the results of fundamental studies on all aspects of chemical phenomena induced by interactions between light and molecules/matter of all kinds. All systems capable of being described at the molecular or integrated multimolecular level are appropriate for the journal. This includes all molecular chemical species as well as biomolecular, supramolecular, polymer and other macromolecular systems, as well as solid state photochemistry. In addition, the journal publishes studies of semiconductor and other photoactive organic and inorganic materials, photocatalysis (organic, inorganic, supramolecular and superconductor). The scope includes condensed and gas phase photochemistry, as well as synchrotron radiation chemistry. A broad range of processes and techniques in photochemistry are covered such as light induced energy, electron and proton transfer; nonlinear photochemical behavior; mechanistic investigation of photochemical reactions and identification of the products of photochemical reactions; quantum yield determinations and measurements of rate constants for primary and secondary photochemical processes; steady-state and time-resolved emission, ultrafast spectroscopic methods, single molecule spectroscopy, time resolved X-ray diffraction, luminescence microscopy, and scattering spectroscopy applied to photochemistry. Papers in emerging and applied areas such as luminescent sensors, electroluminescence, solar energy conversion, atmospheric photochemistry, environmental remediation, and related photocatalytic chemistry are also welcome.