Light-induced damage to DNA origami nanostructures in the 193 nm–310 nm range

IF 1.5 4区 物理与天体物理 Q3 OPTICS
Leo Sala, J. Rakovský, Agnes Zerolová, J. Kočišek
{"title":"Light-induced damage to DNA origami nanostructures in the 193 nm–310 nm range","authors":"Leo Sala, J. Rakovský, Agnes Zerolová, J. Kočišek","doi":"10.1088/1361-6455/acf3bd","DOIUrl":null,"url":null,"abstract":"DNA origami nanostructures provide precisely addressable substrates for in singulo experiments as well as for applications in nanotechnology. We report on experiments evaluating the stability of DNA origami upon irradiation with light at different wavelengths and buffer solutions. DNA is irradiated with nanosecond pulsed lasers and the damage is evaluated using UV–Vis spectroscopy and atomic force microscopy imaging. We show that the wavelength dependence of the damage follows the UV absorption spectrum of DNA. Electronic excitation of DNA is primarily responsible for DNA origami damage at present wavelengths. We also demonstrate UV–Vis absorption of tris reaction products, influencing the UV–Vis absorption evaluation in experiments studying DNA damage.","PeriodicalId":16826,"journal":{"name":"Journal of Physics B: Atomic, Molecular and Optical Physics","volume":" ","pages":""},"PeriodicalIF":1.5000,"publicationDate":"2023-08-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Physics B: Atomic, Molecular and Optical Physics","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1088/1361-6455/acf3bd","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"OPTICS","Score":null,"Total":0}
引用次数: 0

Abstract

DNA origami nanostructures provide precisely addressable substrates for in singulo experiments as well as for applications in nanotechnology. We report on experiments evaluating the stability of DNA origami upon irradiation with light at different wavelengths and buffer solutions. DNA is irradiated with nanosecond pulsed lasers and the damage is evaluated using UV–Vis spectroscopy and atomic force microscopy imaging. We show that the wavelength dependence of the damage follows the UV absorption spectrum of DNA. Electronic excitation of DNA is primarily responsible for DNA origami damage at present wavelengths. We also demonstrate UV–Vis absorption of tris reaction products, influencing the UV–Vis absorption evaluation in experiments studying DNA damage.
光对193中DNA折纸纳米结构的损伤 nm–310 nm范围
DNA折纸纳米结构为singulo实验以及纳米技术的应用提供了精确可寻址的基底。我们报道了评估DNA折纸在不同波长的光和缓冲溶液照射下的稳定性的实验。用纳秒脉冲激光照射DNA,并使用紫外-可见光谱和原子力显微镜成像评估损伤。我们发现损伤的波长依赖性遵循DNA的紫外吸收光谱。DNA的电子激发是目前波长下DNA折纸损伤的主要原因。我们还证明了三反应产物的紫外-可见吸收,影响了研究DNA损伤的实验中的紫外–可见吸收评估。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
3.60
自引率
6.20%
发文量
182
审稿时长
2.8 months
期刊介绍: Published twice-monthly (24 issues per year), Journal of Physics B: Atomic, Molecular and Optical Physics covers the study of atoms, ions, molecules and clusters, and their structure and interactions with particles, photons or fields. The journal also publishes articles dealing with those aspects of spectroscopy, quantum optics and non-linear optics, laser physics, astrophysics, plasma physics, chemical physics, optical cooling and trapping and other investigations where the objects of study are the elementary atomic, ionic or molecular properties of processes.
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