Design and Performance Analysis of Low Sub-Threshold Swing p-Channel Cylindrical Thin-Film Transistors

Q3 Engineering
Viswanath G. Akkili, V. Srivastava
{"title":"Design and Performance Analysis of Low Sub-Threshold Swing p-Channel Cylindrical Thin-Film Transistors","authors":"Viswanath G. Akkili, V. Srivastava","doi":"10.2174/1876402914666220518141705","DOIUrl":null,"url":null,"abstract":"\n\nTin monoxide (SnO) attracts considerable interest for p-channel Cylindrical Thin Film Transistors (CTFTs) applications due to their merits, including low hole effective mass, Sn s and O p orbital hybridization at the valance band maxima, and ambipolar nature, among other p-type oxide semiconductors.\n\n\n\nThis article analyses the influence of channel radius and the impact of dielectric materials on the performance of SnO based CTFT devices through 3D numerical simulations.\n\n\n\nThe radius of the active layer in the CTFT was varied in the range from 10 nm to 30 nm, and it has been observed that an increase of channel radius reduces the switching behavior of the devices.\n\n\n\nThe 10 nm thick CTFT exhibited superior results with a lower threshold voltage of 1.5 V and higher field-effect mobility of 13.12 cm2/V-s over other simulated CTFTs.\n\n\n\nThe obtained mobility values are superior to the existing planar TFTs reports. To improve the device performance further, the CTFTs with various dielectric materials have been simulated and optimized with high field-effect mobility and low sub-threshold swing values.\n","PeriodicalId":18543,"journal":{"name":"Micro and Nanosystems","volume":" ","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2022-05-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Micro and Nanosystems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2174/1876402914666220518141705","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"Engineering","Score":null,"Total":0}
引用次数: 0

Abstract

Tin monoxide (SnO) attracts considerable interest for p-channel Cylindrical Thin Film Transistors (CTFTs) applications due to their merits, including low hole effective mass, Sn s and O p orbital hybridization at the valance band maxima, and ambipolar nature, among other p-type oxide semiconductors. This article analyses the influence of channel radius and the impact of dielectric materials on the performance of SnO based CTFT devices through 3D numerical simulations. The radius of the active layer in the CTFT was varied in the range from 10 nm to 30 nm, and it has been observed that an increase of channel radius reduces the switching behavior of the devices. The 10 nm thick CTFT exhibited superior results with a lower threshold voltage of 1.5 V and higher field-effect mobility of 13.12 cm2/V-s over other simulated CTFTs. The obtained mobility values are superior to the existing planar TFTs reports. To improve the device performance further, the CTFTs with various dielectric materials have been simulated and optimized with high field-effect mobility and low sub-threshold swing values.
低亚阈值摆动p沟道圆柱形薄膜晶体管的设计与性能分析
一氧化锡(SnO)由于其优点,包括低空穴有效质量、价带最大值处的Sn和O轨道杂化以及双极性,以及其他p型氧化物半导体,在p沟道圆柱形薄膜晶体管(CTFT)应用中吸引了相当大的兴趣。本文通过三维数值模拟分析了沟道半径和介电材料对SnO基CTFT器件性能的影响。CTFT中有源层的半径在10nm至30nm的范围内变化,并且已经观察到沟道半径的增加降低了器件的开关行为。与其他模拟的CTFT相比,10nm厚的CTFT具有1.5V的较低阈值电压和13.12cm2/V-s的较高场效应迁移率,显示出优异的结果。所获得的迁移率值优于现有的平面TFT报告。为了进一步提高器件性能,已经模拟并优化了具有高场效应迁移率和低亚阈值摆动值的各种介电材料的CTFT。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Micro and Nanosystems
Micro and Nanosystems Engineering-Building and Construction
CiteScore
1.60
自引率
0.00%
发文量
50
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