Silicon-carbide (SiC) nanocrystal as technology and characterization and its applications in photo-stabilizers of Teflon

Q1 Materials Science

Materials Science for Energy Technologies Pub Date : 2023-01-01 DOI:10.1016/j.mset.2022.12.001

Raghda Alsayed , Dina S. Ahmed , Amani Husain , Mohammed Al-Baidhani , Mohammed Al-Mashhadani , Alaa A. Rashad , Muna Bufaroosha , Emad Yousif

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引用次数: 3

Abstract

Polytetrafluoroethylene (PTFE) was mixed with silicon carbide nanoparticles in various quantities to create thin films. Long-term UV light exposure to the PTFE films was used to study the effects of SiC NPs as a photo-stabilizer by assessing changes in weight loss and surface shape. Comparing PTFE films with various SiC NP concentrations to the blank film, very little variation was seen. AFM and optical microscopy were also used to analyze the surface morphology of films. When PTFE films with additives were compared to blank film, there were hard to observe any negative changes brought due to photo-degradation. Additionally, the surfaces appeared more uniformly smooth hence SiC NPs work well as photo-stabilizers to impede photo-degradation, particularly 0.0005 gm weight. Silicon carbide nanoparticles absorb ultraviolet light, bind polymeric chains, scavenge radical moieties, and degrade peroxide residues.

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碳化硅纳米晶技术、表征及其在聚四氟乙烯光稳定剂中的应用

聚四氟乙烯(PTFE)与不同数量的碳化硅纳米颗粒混合形成薄膜。利用紫外光对聚四氟乙烯薄膜进行长期照射，研究了碳化硅纳米粒子作为光稳定剂的效果，评估了其失重和表面形状的变化。将不同SiC NP浓度的聚四氟乙烯薄膜与空白薄膜进行比较，发现差异很小。利用原子力显微镜和光学显微镜对膜的表面形貌进行了分析。将添加添加剂的PTFE薄膜与空白薄膜进行比较，很难观察到由于光降解而带来的负面变化。此外，表面更加均匀光滑，因此SiC NPs作为光稳定剂可以很好地阻止光降解，特别是0.0005 gm的重量。碳化硅纳米颗粒吸收紫外线，结合聚合链，清除自由基，并降解过氧化物残留物。

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