Physical Insights on Current Dynamics of RESURF DeMOS Designed for High-Frequency CMOS Level Shifter Application

IF 2.5 4区 计算机科学 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Shraddha Pali, Ankur Gupta
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引用次数: 0

Abstract

This work investigates isothermal high-current dynamics of Drain-extended MOS (DeMOS) devices optimized for high-frequency switching applications. Gate charge optimized reduced-surface-field (RESURF) DeNMOS structures using surface-implant (P-Top) and split-gate (SG_NonSTI) have been compared with conventional DeNMOS (C_DeNMOS) to investigate the dynamics of parasitic BJT trigger and subsequent space charge modulation (SCM) under high current conditions. Comparative AC analysis at a different gate and drain bias shows quasi-saturation peaks responsible for space charge modulation under high current conditions in DeMOS devices. The transient analysis investigates the isothermal unclamped inductive switching (UIS) and reverse recovery behavior. The parasitic gate capacitances Cgg and Cgd are reduced in both P-Top and SG_NonSTI. With the lowest turn-off delay under very high current conditions in UIS simulations, SG_NonSTI shows the best switching reliability, while P-Top shows the best reverse recovery and transient switching delay performance. In addition, we have shown the application of proposed DeNMOS devices in designing a high-frequency CMOS level shifter circuit. Compared to C_DeNMOS, the highest operating frequency has increased for P-Top and SG_NonSTI DeNMOS structures by 40% and 35%, respectively.
为高频CMOS电平移位器应用设计的RESURF DeMOS电流动力学的物理见解
本工作研究了针对高频开关应用优化的漏极扩展MOS(DeMOS)器件的等温高电流动力学。将使用表面注入(P-Top)和分离栅极(SG_NonSTI)的栅极电荷优化的减少表面场(RESURF)DeNMOS结构与传统的DeNMOS(C_DeNMOS)进行比较,以研究高电流条件下寄生BJT触发和随后的空间电荷调制(SCM)的动力学。在不同栅极和漏极偏压下的比较AC分析显示了在DeMOS器件中的高电流条件下负责空间电荷调制的准饱和峰值。瞬态分析研究了等温无阻尼电感开关(UIS)和反向恢复行为。寄生栅极电容Cgg和Cgd在P-Top和SG_NonSTI中都减小了。在UIS模拟中,在非常高的电流条件下,SG_NonSTI具有最低的关断延迟,显示出最佳的开关可靠性,而P-Top显示出最好的反向恢复和瞬态开关延迟性能。此外,我们还展示了所提出的DeNMOS器件在设计高频CMOS电平移位器电路中的应用。与C_DeNMOS相比,P-Top和SG_NonSTI DeNMOS结构的最高工作频率分别提高了40%和35%。
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来源期刊
IETE Technical Review
IETE Technical Review 工程技术-电信学
CiteScore
5.70
自引率
4.20%
发文量
48
审稿时长
9 months
期刊介绍: IETE Technical Review is a world leading journal which publishes state-of-the-art review papers and in-depth tutorial papers on current and futuristic technologies in the area of electronics and telecommunications engineering. We also publish original research papers which demonstrate significant advances.
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