Doping Copper Selenide for Tuning the Crystal Structure and Thermoelectric Performance of Germanium Telluride-Based Materials

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Luo Yue, Pengpeng Bai and Shuqi Zheng*, 
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引用次数: 0

Abstract

Germanium telluride (GeTe) compounds exhibit excellent thermoelectric performance. In this study, copper selenide (Cu2Se) was used to tune the crystal structure and carrier concentration (nH) of GeTe materials. The zT of the 1% Cu2Se-doped GeTe sample reaches 1.32, which is 52% higher than that of the pure phase. The results show that Cu2Se tunes the GeTe crystal structure and carrier concentration to achieve promising enhancements to the thermoelectric performance. Meanwhile, a herringbone-like crystal structure that reduces the lattice thermal conductivity was observed. However, because the directional movement of Cu ions at high temperatures leads to an increase in electrical conductivity, the electronic thermal conductivity also increased. This study focuses on crystal engineering strategies for the study of nontoxic thermoelectric materials.

Abstract Image

掺杂硒化铜用于调整碲化锗基材料的晶体结构和热电性能
碲化锗(GeTe)化合物具有优异的热电性能。本研究采用硒化铜(Cu2Se)调控GeTe材料的晶体结构和载流子浓度(nH)。1% cu2se掺杂的GeTe样品zT达到1.32,比纯相提高了52%。结果表明,Cu2Se可以调节GeTe的晶体结构和载流子浓度,从而提高热电性能。同时,观察到一个人字骨状的晶体结构,降低了晶格热导率。然而,由于Cu离子在高温下的定向运动导致电导率的增加,电子导热系数也随之增加。本研究的重点是研究无毒热电材料的晶体工程策略。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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