Oxidation and hydrogenation of monolayer MoS2 with compositing agent under environmental exposure: The ReaxFF Mo/Ti/Au/O/S/H force field development and applications

IF 4.1 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Q. Mao, Yuwei Zhang, M. Kowalik, Nadire Nayir, M. Chandross, A. V. van Duin
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引用次数: 1

Abstract

An atomistic modeling tool is essential to an in-depth understanding upon surface reactions of transition metal dichalcogenides (TMDs), such as molybdenum disulfide (MoS2), with the presence of compositing agents, including Ti and Au, under different environmental exposures. We report a new ReaxFF reactive force field parameter set for Mo, Ti, Au, O, S, and H interactions. We apply the force field in a series of molecular dynamics (MD) simulations to unravel the impact of the Ti dopant on the oxidation/hydrogenation behaviors of MoS2 surface. The simulation results reveal that, in the absence of Ti clusters, the MoS2 surface is ruptured and oxidized at elevated temperatures through a process of adsorption followed by dissociation of the O2 molecules on the MoS2 surface during the temperature ramp. When the MoS2 surface is exposed to H2O molecules, surface hydrogenation is most favored, followed by oxidation, then hydroxylation. The introduction of Ti clusters to the systems mitigates the oxidation/hydrogenation of MoS2 at a low or intermediate temperature by capturing the O2/H2O molecules and locking the O/H-related radicals inside the clusters. However, OH− and H3O+ are emitted from the Ti clusters in the H2O environment as temperature rises, and the accelerating hydrogenation of MoS2 is consequently observed at an ultra-high temperature. These findings indicate an important but complex role of Ti dopants in mitigating the oxidation and hydrogenation of MoS2 under different environmental exposures. The possible mechanisms of oxidation and hydrogenation revealed by MD simulations can give an insight to the design of oxidation resistant TMDs and can be useful to the optical, electronic, magnetic, catalytic, and energy harvesting industries.
环境暴露下复合剂氧化加氢单层二硫化钼:ReaxFF Mo/Ti/Au/O/S/H力场的开发与应用
原子建模工具对于深入了解过渡金属二硫属化物(TMDs)(如二硫化钼(MoS2))在不同环境暴露下与包括Ti和Au在内的合成剂的表面反应至关重要。我们报道了Mo、Ti、Au、O、S和H相互作用的一个新的ReaxFF反作用力场参数集。我们在一系列分子动力学(MD)模拟中应用力场来揭示Ti掺杂剂对MoS2表面氧化/氢化行为的影响。模拟结果表明,在不存在Ti团簇的情况下,MoS2表面在升高的温度下通过吸附过程破裂和氧化,然后在温度上升过程中O2分子在MoS2表面解离。当MoS2表面暴露于H2O分子时,最有利于表面氢化,其次是氧化,然后是羟基化。通过捕获O2/H2O分子并将O/H相关自由基锁定在团簇内,将Ti团簇引入到系统中减轻了MoS2在低温或中等温度下的氧化/氢化。然而,随着温度的升高,OH−和H3O+从H2O环境中的Ti团簇中释放出来,因此在超高温下观察到MoS2的加速氢化。这些发现表明,在不同的环境暴露下,Ti掺杂剂在减轻MoS2的氧化和氢化方面发挥着重要但复杂的作用。MD模拟揭示的氧化和氢化的可能机制可以深入了解抗氧化TMDs的设计,并可用于光学、电子、磁性、催化和能量收集行业。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Frontiers in Nanotechnology
Frontiers in Nanotechnology Engineering-Electrical and Electronic Engineering
CiteScore
7.10
自引率
0.00%
发文量
96
审稿时长
13 weeks
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