Enhanced Hall Mobility and d0 Ferromagnetism in Li-Doped ZnO Thin Films Prepared by Aerosol-Assisted CVD

IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Muhammad Arief Mustajab, Pepen Arifin, Suprijadi Suprijadi, Toto Winata
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Abstract

Zinc oxide (ZnO) thin films with different concentrations of lithium, from 0 to 15 mol%, have been grown on Si(100) substrates by employing aerosol-assisted chemical vapor deposition (AACVD). The structural, electronic, and magnetic properties of the ZnO thin films were investigated as the effect of Li doping concentration. SEM images of surface morphology reveal that the undoped and low-concentration Li-doped ZnO thin films exhibit irregular ellipsoid grains. In comparison, the ZnO thin films with higher Li concentration consist of multi-aligned rod-like and hexagonal-shaped grains. XRD pattern analysis confirms that all grown ZnO thin films exhibit a single polycrystalline phase of hexagonal wurtzite crystal. The lattice reduction was observed in the Li-doped thin films indicating that the substitutional Li effectively occupied the Zn lattice site. The Hall effect measurement demonstrates that Li-doped ZnO films possess p-type conductivity. The resistivity of Li-doped ZnO thin films decreases with an increase in Li doping concentration while the hole carrier density increases. The Hall mobility tends to increase as more Li doping concentration is given, with the highest Hall mobility obtained from 15 mol% Li-doped film with a value of 85.88 cm2/V s. The VSM study demonstrates that all grown ZnO thin films exhibit an M-H hysteresis curve, indicating d0 ferromagnetism behavior at room temperature, with coercivity ranging from 202 to 373 Oe. The highest saturation magnetization was obtained from 10 mol% Li-doped films, with a value of 5.55 × 10–2 emu/g.

Graphical Abstract

Abstract Image

气溶胶辅助CVD制备li掺杂ZnO薄膜的增强霍尔迁移率和d^0铁磁性
通过采用气溶胶辅助化学气相沉积(AACVD)技术,在硅(100)基底上生长出了不同锂浓度(0 至 15 摩尔%)的氧化锌(ZnO)薄膜。研究了锂掺杂浓度对氧化锌薄膜结构、电子和磁性能的影响。表面形貌的扫描电镜图像显示,未掺杂和低浓度锂掺杂的氧化锌薄膜呈现出不规则的椭圆形晶粒。相比之下,锂浓度较高的氧化锌薄膜由多排列的棒状和六角形晶粒组成。XRD 图谱分析证实,所有生长出来的氧化锌薄膜都呈现出六方菱形晶体的单一多晶相。在掺锂的薄膜中观察到晶格降低,这表明置换的锂有效地占据了锌晶格位点。霍尔效应测量表明,掺锂氧化锌薄膜具有 p 型导电性。掺锂氧化锌薄膜的电阻率随着掺锂浓度的增加而降低,同时空穴载流子密度增加。霍尔迁移率随着锂掺杂浓度的增加而增加,锂掺杂浓度为 15 mol% 的薄膜霍尔迁移率最高,达到 85.88 cm2/V s。VSM 研究表明,所有生长的氧化锌薄膜都呈现出 M-H 磁滞曲线,表明其在室温下具有 d0 铁磁性,矫顽力范围为 202 至 373 Oe。掺杂 10 摩尔%锂的薄膜的饱和磁化率最高,达到 5.55 × 10-2 emu/g。
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来源期刊
Electronic Materials Letters
Electronic Materials Letters 工程技术-材料科学:综合
CiteScore
4.70
自引率
20.80%
发文量
52
审稿时长
2.3 months
期刊介绍: Electronic Materials Letters is an official journal of the Korean Institute of Metals and Materials. It is a peer-reviewed international journal publishing print and online version. It covers all disciplines of research and technology in electronic materials. Emphasis is placed on science, engineering and applications of advanced materials, including electronic, magnetic, optical, organic, electrochemical, mechanical, and nanoscale materials. The aspects of synthesis and processing include thin films, nanostructures, self assembly, and bulk, all related to thermodynamics, kinetics and/or modeling.
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