A Novel Apparatus to Standardize the Polishing Protocol to Achieve Different Roughness of Titanium and Zirconia Disc Surfaces.

Gayathiri Elangovan, Deepak Ipe, Peter Reher, Carlos M Figueredo, Andrew B Cameron
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Abstract

Purpose: To propose and evaluate standardized polishing protocols for in vitro experiments using a custommade apparatus under controlled force to create consistent surface roughness on titanium and zirconia discs.

Materials and methods: A total of 160 discs were manufactured with a diameter of 10 mm, 80 titanium (Ti) and 80 zirconium oxide (Zr). Specimens were categorized into two groups: controlled force (CF) and without controlled force (WCF). Specimens in the CF group were polished with a custom apparatus incorporating a tension gauge on the Ti and Zr disc surfaces to achieve consistent roughness. The WCF group was polished without the use of a tension gauge. Each group had four subgroups (n = 10): control/machined with no polishing (C), rough (R), smooth (S), and very smooth (VS). The subgroups were processed using a sequence of diamond-impregnated polishing burs and polishing paste.

Results: The CF group showed consistent surface roughness and a gradual decrease in surface roughness. Control in Ti (Ra = 6.5 ± 0.03 μm) and in Zr (Ra = 5.4 ± 0.04 μm); R in Ti (Ra = 3.5 ± 0.06 μm) and in Zr (Ra = 3.2 ± 0.07 μm); S in Ti (Ra = 1.5 ± 0.04 μm) and in Zr (Ra = 1.1 ± 0.06 μm); and VS in Ti (Ra = 0.05 ± 0.002 μm) and in Zr (Ra = 0.02 ± 0.005 μm). There were significant differences for R, S, and SV under CF and WCF in Ti and Zr surfaces.

Conclusions: The specimens polished under control force produced significantly more uniform surface roughness than those polished without controlled force and were produced with a higher degree of consistency.

一种新的装置,用于标准化抛光协议,以实现钛和氧化锆圆盘表面的不同粗糙度。
目的:本研究旨在提出并评估体外实验的标准化抛光方案,使用定制的仪器在受控力下在钛和氧化锆圆盘上产生一致的表面粗糙度。方法:共制作160个直径为10mm的椎间盘,80个钛(Ti)和80个氧化锆(Zr)。样本分为两组:控制力(CF)和无控制力(WCF)。CF组中的样品用定制设备抛光,该设备在Ti和Zr盘表面上结合了张力计,以实现一致的粗糙度。WCF在不使用张力计的情况下进行抛光。每组有4个亚组(每组10个圆盘):对照/机械加工(C),无抛光、粗糙(R)、光滑(S)和非常光滑(VS)。使用一系列浸渍金刚石的抛光刷和抛光膏对亚组进行处理。结果:CF组表面粗糙度一致,表面粗糙度逐渐降低。Ti中的对照组(Ra=6.5±0.03µm)和Zr中的对照(Ra=5.4±0.04µm);Ti中的R(Ra=3.5±0.06µm),Zr中的R=3.2±0.07µm;Ti中的S(Ra=1.5±0.04µm),Zr中的S为(Ra=1.1±006µm);Ti中的VS(Ra=0.05±0.002µm),Zr中的VS为(Ra=0.02±0.005µm)。在CF和WCF作用下,Ti和Zr表面的R、S和SV存在显著差异。结论:在控制力下抛光的试样比未控制力抛光的试样产生更均匀的表面粗糙度,并且具有更高的一致性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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