Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis

IF 8.2 1区 化学 Q1 CHEMISTRY, PHYSICAL
Junling Lu , Jeffrey W. Elam , Peter C Stair
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引用次数: 232

Abstract

Catalyst synthesis with precise control over the structure of catalytic active sites at the atomic level is of essential importance for the scientific understanding of reaction mechanisms and for rational design of advanced catalysts with high performance. Such precise control is achievable using atomic layer deposition (ALD). ALD is similar to chemical vapor deposition (CVD), except that the deposition is split into a sequence of two self-limiting surface reactions between gaseous precursor molecules and a substrate. The unique self-limiting feature of ALD allows conformal deposition of catalytic materials on a high surface area catalyst support at the atomic level. The deposited catalytic materials can be precisely constructed on the support by varying the number and type of ALD cycles. As an alternative to the wet-chemistry based conventional methods, ALD provides a cycle-by-cycle “bottom-up” approach for nanostructuring supported catalysts with near atomic precision.

In this review, we summarize recent attempts to synthesize supported catalysts with ALD. Nucleation and growth of metals by ALD on oxides and carbon materials for precise synthesis of supported monometallic catalyst are reviewed. The capability of achieving precise control over the particle size of monometallic nanoparticles by ALD is emphasized. The resulting metal catalysts with high dispersions and uniformity often show comparable or remarkably higher activity than those prepared by conventional methods. For supported bimetallic catalyst synthesis, we summarize the strategies for controlling the deposition of the secondary metal selectively on the primary metal nanoparticle but not on the support to exclude monometallic formation. As a review of the surface chemistry and growth behavior of metal ALD on metal surfaces, we demonstrate the ways to precisely tune size, composition and structure of bimetallic metal nanoparticles. The cycle-by-cycle “bottom up” construction of bimetallic (or multiple components) nanoparticles with near atomic precision on supports by ALD is illustrated. Applying metal oxide ALD over metal nanoparticles can be used to precisely synthesize nanostructured metal catalysts. In this part, the surface chemistry of Al2O3 ALD on metals is specifically reviewed. Next, we discuss the methods of tailoring the catalytic performance of metal catalysts including activity, selectivity and stability, through selective blocking of the low-coordination sites of metal nanoparticles, the confinement effect, and the formation of new metal-oxide interfaces. Synthesis of supported metal oxide catalysts with high dispersions and “bottom up” nanostructured photocatalytic architectures are also included. Therein, the surface chemistry and morphology of oxide ALD on oxides and carbon materials as well as their catalytic performance are summarized.

原子层沉积-自底向上合成先进催化剂的顺序自限制表面反应
在原子水平上精确控制催化活性位点结构的催化剂合成对于科学认识反应机理和合理设计高性能的先进催化剂具有重要意义。使用原子层沉积(ALD)可以实现这种精确控制。ALD类似于化学气相沉积(CVD),不同之处在于该沉积被分成气态前体分子和底物之间的两个自限制表面反应序列。ALD独特的自限制特性允许催化材料在原子水平上的高表面积催化剂载体上的保形沉积。通过改变ALD循环的次数和类型,沉积的催化材料可以精确地构建在载体上。作为基于湿化学的传统方法的替代方案,ALD提供了一种逐循环“自下而上”的方法,以接近原子精度的方式构建纳米结构支撑催化剂。本文综述了近年来合成ALD负载型催化剂的研究进展。本文综述了ALD在氧化物和碳材料上的成核和生长,用于负载型单金属催化剂的精确合成。强调了ALD实现对单金属纳米颗粒粒度精确控制的能力。所得的金属催化剂具有高分散性和均匀性,通常表现出与传统方法制备的催化剂相当或显着更高的活性。对于负载型双金属催化剂的合成,我们总结了选择性地控制次级金属沉积在原生金属纳米颗粒上而不是在载体上以排除单金属形成的策略。本文综述了金属ALD在金属表面的表面化学和生长行为,展示了精确调节双金属金属纳米颗粒的大小、组成和结构的方法。在ALD的支持下,循环“自下而上”的双金属(或多组分)纳米颗粒结构具有接近原子精度。在金属纳米颗粒上应用金属氧化物ALD可以精确合成纳米结构的金属催化剂。本部分详细介绍了金属表面Al2O3 ALD的表面化学性质。接下来,我们讨论了通过选择性阻断金属纳米颗粒的低配位、限制效应和形成新的金属-氧化物界面来调整金属催化剂的催化性能的方法,包括活性、选择性和稳定性。高分散负载型金属氧化物催化剂的合成和“自下而上”纳米结构光催化结构也包括在内。综述了氧化物ALD在氧化物和碳材料上的表面化学、形貌及其催化性能。
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来源期刊
Surface Science Reports
Surface Science Reports 化学-物理:凝聚态物理
CiteScore
15.90
自引率
2.00%
发文量
9
审稿时长
178 days
期刊介绍: Surface Science Reports is a journal that specializes in invited review papers on experimental and theoretical studies in the physics, chemistry, and pioneering applications of surfaces, interfaces, and nanostructures. The topics covered in the journal aim to contribute to a better understanding of the fundamental phenomena that occur on surfaces and interfaces, as well as the application of this knowledge to the development of materials, processes, and devices. In this journal, the term "surfaces" encompasses all interfaces between solids, liquids, polymers, biomaterials, nanostructures, soft matter, gases, and vacuum. Additionally, the journal includes reviews of experimental techniques and methods used to characterize surfaces and surface processes, such as those based on the interactions of photons, electrons, and ions with surfaces.
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