Reduced cortical gyrification in the posteromedial cortex in unaffected relatives of schizophrenia patients with high genetic loading.

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Inkyung Park, Minah Kim, Tae Young Lee, Wu Jeong Hwang, Yoo Bin Kwak, Sanghoon Oh, Silvia Kyungjin Lho, Sun-Young Moon, Jun Soo Kwon
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引用次数: 6

Abstract

Although abnormal cortical gyrification has been consistently reported in patients with schizophrenia, whether gyrification abnormalities reflect a genetic risk for the disorder remains unknown. This study investigated differences in cortical gyrification between unaffected relatives (URs) with high genetic loading for schizophrenia and healthy controls (HCs) to identify potential genetic vulnerability markers. A total of 50 URs of schizophrenia patients and 50 matched HCs underwent T1-weighted magnetic resonance imaging to compare whole-brain gyrification using the local gyrification index (lGI). Then, the lGI clusters showing significant differences were compared between the UR subgroups based on the number of first-degree relatives with schizophrenia to identify the effect of genetic loading on cortical gyrification changes. The URs exhibited significantly lower cortical gyrification than the HCs in clusters including medial parieto-occipital and cingulate regions comprising the bilateral precuneus, cuneus, pericalcarine, lingual, isthmus cingulate, and posterior cingulate gyri. Moreover, URs who had two or more first-degree relatives with schizophrenia showed greater gyrification reductions in these clusters than those who had at least one first-degree relative with schizophrenia. Our findings of reduced gyrification in URs, which are consistent with accumulated evidence of hypogyria observed in regions showing patient-control differences in previous studies, highlight that such hypogyria in posteromedial regions may serve as a genetic vulnerability marker and reflect early neurodevelopmental abnormalities resulting from a genetic risk for schizophrenia.

Abstract Image

Abstract Image

高基因负荷精神分裂症患者未受影响亲属的后内侧皮质皮质回旋减少。
尽管在精神分裂症患者中一直有异常皮质旋转的报道,但旋转异常是否反映了该疾病的遗传风险仍然未知。本研究调查了精神分裂症高遗传负荷的未受影响亲属(URs)和健康对照(hc)之间皮质旋回的差异,以确定潜在的遗传易感性标记。共有50例精神分裂症患者和50例匹配的hc患者接受了t1加权磁共振成像,使用局部旋转指数(lGI)比较全脑旋转。然后,根据患有精神分裂症的一级亲属数量,比较UR亚组之间存在显著差异的lGI簇,以确定遗传负荷对皮质旋回变化的影响。URs表现出明显低于hc的皮质回化,包括内侧顶枕区和扣带区,包括双侧楔前叶、楔前叶、骨周、舌、峡扣带和扣带后回。此外,有两个或更多一级亲属患有精神分裂症的URs在这些群集中显示出比至少有一个一级亲属患有精神分裂症的患者更大的回转减少。我们的研究结果表明,尿潴留减少,这与先前研究中在患者对照差异区域观察到的脑回功能减退的积累证据一致,强调后内侧区域的脑回功能减退可能是一种遗传易感标志物,反映了精神分裂症遗传风险导致的早期神经发育异常。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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