Interfacial Thermal Conductance between Cu and Diamond with Interconnected W−W2C Interlayer

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Yongjian Zhang, Ziyang Wang, Ning Li, Zhanxun Che, Xiaoyan Liu, Guo Chang, Jinpeng Hao, Jingjie Dai, Xitao Wang, Fangyuan Sun* and Hailong Zhang*, 
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引用次数: 9

Abstract

Manipulating the interfacial structure is vital to enhancing the interfacial thermal conductance (G) in Cu/diamond composites for promising thermal management applications. An interconnected interlayer is frequently observed in Cu/diamond composites; however, the G between Cu and diamond with an interconnected interlayer has not been addressed so far and thus is attracting extensive attention in the field. In this study, we designed three kinds of interlayers between a Cu film and a diamond substrate by magnetron sputtering coupled with heat treatment, including a W interlayer, an interconnected W–W2C interlayer, and a W2C interlayer, to comparatively elucidate the relationship between the interfacial structure and the interfacial thermal conductance. For the first time, we experimentally measured the G between Cu and diamond with an interconnected interlayer by a time-domain thermoreflectance technique. The Cu/W–W2C/diamond structure exhibits an intermediate G value of 25.8 MW/m2 K, higher than the 19.9 MW/m2 K value for the Cu/W2C/diamond structure and lower than the 29.4 MW/m2 K value for the Cu/W/diamond structure. The molecular dynamics simulations show that the G of the individual W2C/diamond interface is much higher than those of the individual Cu/diamond and W/diamond interfaces and W2C could reduce the vibrational mismatch between Cu and diamond; however, the G of the Cu/W2C/diamond structure is reduced by the lower thermal conductivity of W2C. This study provides insights into the relationship between the interconnected interfacial structure and the G between Cu and diamond and offers guidance for interface design to improve the thermal conductivity in Cu/diamond composites.

Abstract Image

具有互连W−W2C中间层的Cu与金刚石界面热导
控制界面结构对于提高Cu/金刚石复合材料的界面热导率(G)至关重要,这是有前途的热管理应用。在Cu/金刚石复合材料中经常观察到相互连接的中间层;然而,由于铜与金刚石之间的G具有相互连接的中间层,因此迄今为止尚未得到解决,因此引起了广泛的关注。在本研究中,我们采用磁控溅射耦合热处理的方法设计了三种Cu薄膜与金刚石衬底之间的中间层,包括W中间层、互连W - W2C中间层和W2C中间层,以比较阐明界面结构与界面导热系数之间的关系。本文首次利用时域热反射技术实验测量了具有相互连接中间层的Cu和金刚石之间的G。Cu/W - W2C/金刚石结构的中间G值为25.8 MW/m2 K,高于Cu/W2C/金刚石结构的19.9 MW/m2 K值,低于Cu/W/金刚石结构的29.4 MW/m2 K值。分子动力学模拟表明,W2C/金刚石界面的G值远高于Cu/金刚石和W/金刚石界面的G值,W2C可以减小Cu和金刚石之间的振动失配;由于W2C的导热系数较低,Cu/W2C/金刚石结构的G值降低。本研究揭示了Cu和金刚石之间的界面结构与G之间的关系,为Cu/金刚石复合材料的界面设计提供了指导,以提高Cu/金刚石复合材料的导热性。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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