Selective area epitaxy by metalorganic chemical vapor deposition– a tool for photonic and novel nanostructure integration

IF 7.4 1区 物理与天体物理 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC
P. Daniel Dapkus , Chun Yung Chi , Sang Jun Choi , Hyung Joon Chu , Mitchell Dreiske , Rijuan Li , Yenting Lin , Yoshitake Nakajima , Dawei Ren , Ryan Stevenson , Maoqing Yao , Ting Wei Yeh , Hanmin Zhao
{"title":"Selective area epitaxy by metalorganic chemical vapor deposition– a tool for photonic and novel nanostructure integration","authors":"P. Daniel Dapkus ,&nbsp;Chun Yung Chi ,&nbsp;Sang Jun Choi ,&nbsp;Hyung Joon Chu ,&nbsp;Mitchell Dreiske ,&nbsp;Rijuan Li ,&nbsp;Yenting Lin ,&nbsp;Yoshitake Nakajima ,&nbsp;Dawei Ren ,&nbsp;Ryan Stevenson ,&nbsp;Maoqing Yao ,&nbsp;Ting Wei Yeh ,&nbsp;Hanmin Zhao","doi":"10.1016/j.pquantelec.2020.100304","DOIUrl":null,"url":null,"abstract":"<div><p><span>Selective area epitaxial (SAE) growth of III-V materials and devices by metalorganic chemical vapor deposition<span> is selectively reviewed to illustrate the concepts employed in this technology and its most relevant applications. Special focus on the use of SAE use for photonic integration, heterogeneous integration of materials relevant to photonic integration, and </span></span>nanostructure integration is made. Throughout, the pioneering work led by Professor James J. Coleman is used to illustrate the value of using selective growth for various applications.</p></div>","PeriodicalId":414,"journal":{"name":"Progress in Quantum Electronics","volume":"75 ","pages":"Article 100304"},"PeriodicalIF":7.4000,"publicationDate":"2021-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/j.pquantelec.2020.100304","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Progress in Quantum Electronics","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S007967272030063X","RegionNum":1,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 5

Abstract

Selective area epitaxial (SAE) growth of III-V materials and devices by metalorganic chemical vapor deposition is selectively reviewed to illustrate the concepts employed in this technology and its most relevant applications. Special focus on the use of SAE use for photonic integration, heterogeneous integration of materials relevant to photonic integration, and nanostructure integration is made. Throughout, the pioneering work led by Professor James J. Coleman is used to illustrate the value of using selective growth for various applications.

金属有机化学气相沉积的选择性区域外延——光子与新型纳米结构集成的工具
本文综述了金属有机化学气相沉积的III-V材料和器件的选择性区域外延(SAE)生长,以说明该技术中所采用的概念及其最相关的应用。重点介绍了SAE在光子集成、与光子集成相关的材料异质集成、纳米结构集成等方面的应用。在整个过程中,詹姆斯·j·科尔曼教授领导的开创性工作被用来说明在各种应用中使用选择性生长的价值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
Progress in Quantum Electronics
Progress in Quantum Electronics 工程技术-工程:电子与电气
CiteScore
18.50
自引率
0.00%
发文量
23
审稿时长
150 days
期刊介绍: Progress in Quantum Electronics, established in 1969, is an esteemed international review journal dedicated to sharing cutting-edge topics in quantum electronics and its applications. The journal disseminates papers covering theoretical and experimental aspects of contemporary research, including advances in physics, technology, and engineering relevant to quantum electronics. It also encourages interdisciplinary research, welcoming papers that contribute new knowledge in areas such as bio and nano-related work.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信