Defect-Controlled p-Type Conductivity in an Ultrawide-Bandgap ZnGa2O4 Film

IF 3.6 2区 化学 Q2 CHEMISTRY, MULTIDISCIPLINARY
Crystal Growth & Design Pub Date : 2026-10-21 Epub Date: 2026-10-03 DOI:10.1021/acs.cgd.6c00866
Mohammad M. Afandi, Dong-Gwan Kim, Ha Young Kang, Yoonho Choi, Gyeong Ryul Lee, Yeongmin Park, Jongsu Kim, Taehoon Lee, Roy B. Chung
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引用次数: 0

Abstract

Ultrawide-bandgap (UWBG) semiconductors are central to next-generation power electronics and deep-UV optoelectronics, yet the absence of reliable p-type materials remains a critical bottleneck. Here, we demonstrate stable intrinsic p-type conductivity in the spinel UWBG oxide ZnGa2O4, epitaxially grown on c-plane sapphire via mist chemical vapor deposition. The films exhibit high crystalline quality, evidenced by relatively narrow rocking curves and atomically smooth surfaces. Hall measurements confirm stable p-type conduction with a hole mobility of 4.43 cm2 V−1 s−1 and a carrier concentration on the order of 1015 cm−3 in the optimized film at room temperature. By off-stoichiometrically tuning the Zn/Ga precursor ratio, we reveal that intrinsic p-type behavior originates from the antisite defect, establishing cation disorder as an important mechanism governing carrier polarity. Comprehensive structural, optical, electrical, and first-principles analyses indicate the interplay between defect chemistry and charge transport in spinel oxides. These results position ZnGa2O4 as a viable p-type UWBG semiconductor and introduce defect-controlled spinel oxides as promising materials for future high-power and extreme-environment electronics.

超宽带隙ZnGa2O4薄膜中缺陷控制的p型电导率
超宽带隙(UWBG)半导体是下一代电力电子和深紫外光电子技术的核心,但缺乏可靠的p型材料仍然是一个关键瓶颈。在这里,我们证明了尖晶石UWBG氧化物ZnGa2O4具有稳定的p型固有导电性,通过雾状化学气相沉积在c平面蓝宝石上外延生长。该薄膜具有较高的结晶质量,表现为相对狭窄的摇摆曲线和原子光滑的表面。霍尔测量证实,在室温下,优化膜的空穴迁移率为4.43 cm2 V−1 s−1,载流子浓度为1015 cm−3,p型导电稳定。通过非化学调整Zn/Ga前驱体比,我们揭示了内在的p型行为源于反位缺陷,确立了阳离子无序是控制载流子极性的重要机制。综合结构、光学、电学和第一性原理分析表明尖晶石氧化物中缺陷化学和电荷输运之间的相互作用。这些结果将ZnGa2O4定位为可行的p型UWBG半导体,并将缺陷控制尖晶石氧化物作为未来高功率和极端环境电子产品的有前途的材料。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Crystal Growth & Design
Crystal Growth & Design 化学-材料科学:综合
CiteScore
6.30
自引率
10.50%
发文量
650
审稿时长
1.9 months
期刊介绍: The aim of Crystal Growth & Design is to stimulate crossfertilization of knowledge among scientists and engineers working in the fields of crystal growth, crystal engineering, and the industrial application of crystalline materials. Crystal Growth & Design publishes theoretical and experimental studies of the physical, chemical, and biological phenomena and processes related to the design, growth, and application of crystalline materials. Synergistic approaches originating from different disciplines and technologies and integrating the fields of crystal growth, crystal engineering, intermolecular interactions, and industrial application are encouraged.
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