Scale-Resolved Silicon Deposition in a Jacketed Silane Reactor

IF 4.3 2区化学 Q2 CHEMISTRY, MULTIDISCIPLINARY

Chemical Communications Pub Date : 2026-10-20 DOI:10.1039/d6cc00605a

Lu Qin,Jiyi Zhu,Yanzhe Gai,Pengfei Chu,Dezhi Yi,Qianjin Cai,Guojun Meng,Rui Guo,Yongfeng Lv,Hongjun Zhang,Guangning Qian,Chunxin Luo,Song Du,Zheng Liang

引用次数: 0

Abstract

Matched-basis steady-RANS simulations separate single-rod axial nonuniformity from full-reactor rod-to-rod maldistribution in a jacketed silane reactor. Feed/exhaust topology strongly redistributes rod deposition at fixed precursor throughput, while the apparent cooling-jacket-radius response depends materially on the feed basis. Reduced chemistry is interpreted only within its configured scope.

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在夹套式硅烷反应器中尺度分辨硅沉积

基于匹配的稳态rans模拟将夹套硅烷反应器中单棒轴向不均匀性与全反应器棒间不均匀性分离开来。在固定的前驱体吞吐量下，进料/排气拓扑结构强烈地重新分配了棒沉积，而表观冷却夹套半径响应主要取决于进料基础。还原化学仅在其设定的范围内解释。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Chemical Communications 化学-化学综合

CiteScore

8.60

自引率

4.10%

发文量

2705

审稿时长

1.4 months

期刊介绍： ChemComm (Chemical Communications) is renowned as the fastest publisher of articles providing information on new avenues of research, drawn from all the world''s major areas of chemical research.