Flux-tunable transmon with an Al/AlO x /4Hb-TaS2 Josephson junction

IF 3.8 2区 物理与天体物理 Q2 PHYSICS, APPLIED
Eliya Blumenthal,Ilay Mangel,Amit Kanigel,Shay Hacohen-Gourgy
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Abstract

Incorporating van der Waals (vdW) superconductors into Josephson elements extends circuit-QED beyond conventional Al/AlOx/Al junctions, enabling microwave probes of unconventional condensates and subgap excitations. We realize a flux-tunable transmon whose nonlinear inductive element is an Al/AlOx/4Hb-TaS2 Josephson junction, with a tunnel barrier formed by full in situ oxidation of ultrathin Al layers on an exfoliated 4Hb-TaS2 flake in a process compatible with standard transmon fabrication. In a three-dimensional copper cavity, the device shows a SQUID-like flux-dependent spectrum that is well reproduced by a dressed transmon–cavity Hamiltonian in the transmon regime. We measure sub-microsecond energy relaxation (T1=0.08–0.69 μs), while Ramsey measurements indicate dephasing faster than our 16 ns resolution. A naive Ambegaokar–Baratoff comparison using room-temperature junction resistances gives a suppressed effective energy scale; however, cross-sectional TEM reveals an amorphous region at the TaS2 interface, most likely produced by the pre-deposition ion-milling step. We therefore attribute the suppressed EJRn product primarily to a non-ideal hybrid interface. This work demonstrates the integration of 4Hb-TaS2 into a circuit-QED device and establishes an interface-optimization baseline for future edge-sensitive designs targeting boundary and subgap degrees of freedom in vdW superconductors.
具有Al/AlO x /4Hb-TaS2约瑟夫森结的磁通可调发射机
将范德华(vdW)超导体结合到约瑟夫森元件中,使电路qed超越了传统的Al/AlOx/Al结,实现了非常规凝聚物和亚间隙激发的微波探测。我们实现了一个磁通可调的transmon,其非线性感应元件是Al/AlOx/4Hb-TaS2 Josephson结,在与标准transmon制造工艺兼容的过程中,在脱落的4Hb-TaS2薄片上对超薄Al层进行完全原位氧化形成隧道势垒。在三维铜腔中,该装置显示出类似squid的通量依赖光谱,该光谱可以通过在transmon区中修饰的transmon - cavity哈密顿量很好地再现。我们测量到了亚微秒的能量弛豫(T1= 0.08-0.69 μs),而Ramsey测量表明去相速度比我们的16 ns分辨率快。使用室温结电阻的朴素Ambegaokar-Baratoff比较给出了抑制的有效能量标度;然而,横截面透射电镜显示,在TaS2界面上有一个非晶态区域,很可能是由预沉积离子铣削步骤产生的。因此,我们将抑制EJRn产物主要归因于非理想混合界面。这项工作展示了将4Hb-TaS2集成到电路qed器件中,并为未来针对vdW超导体的边界和子间隙自由度的边缘敏感设计建立了接口优化基线。
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来源期刊
Applied Physics Letters
Applied Physics Letters 物理-物理:应用
CiteScore
6.40
自引率
10.00%
发文量
1821
审稿时长
1.6 months
期刊介绍: Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.
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