Ligand-Mediated Nuclearity Tuning of Tin Oxo Clusters for Advanced Lithography (Small 58/2026)

IF 11.8 2区材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY

Small Pub Date : 2026-10-18 DOI:10.1002/smll.76001

Seong-Ji Ha, Jin Young Lee, Bo Kyu Kwon, Seung Gyu Gyeong, Doojin Jeon, Ji-Hyun Jang

引用次数: 0

Abstract

Advanced Lithography

A tailored design strategy for Sn-based inorganic photoresists is demonstrated through precise ligand modulation to tune cluster nuclearity. Modulating the nuclearity dictates distinct exposure pathways and stochastic reaction volumes for each cluster system. Consequently, these molecularly engineered architectures enable high-fidelity nanoscale patterning with balanced sensitivity and roughness, establishing a versatile material platform for next-generation lithography. More in Research Article e75331, Ji-Hyun Jang and co-workers.

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配体介导的锡氧簇核调谐用于先进光刻（Small 58/2026）

通过精确的配体调制来调整簇核，展示了一种针对锡基无机光刻胶的定制设计策略。调节核度决定了每个簇系统不同的暴露途径和随机反应体积。因此，这些分子工程结构实现了高保真的纳米级图形，具有平衡的灵敏度和粗糙度，为下一代光刻建立了一个通用的材料平台。更多研究文章e75331，张智贤和同事。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Small 工程技术-材料科学：综合

CiteScore

17.70

自引率

3.80%

发文量

1830

审稿时长

2.1 months

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