Orientation-dependent deformation and subsurface damage mechanisms of sulfur-doped InP wafers under indentation loading

IF 6.2 2区 材料科学 Q1 MATERIALS SCIENCE, CHARACTERIZATION & TESTING
Materials Characterization Pub Date : 2026-10-01 Epub Date: 2026-09-29 DOI:10.1016/j.matchar.2026.117124
Junjiang Zhou, Hua Wei, Jiayun Deng, Hanbao Liu, Jie Yang, Chong Wang, Feng Qiu, Feng Hui, Xueqin Pang, Bin Yang
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Abstract

Sulfur-doped indium phosphide (InP) is an important III–V compound semiconductor used in high-speed optoelectronic and photonic devices. Its brittle and anisotropic response makes it susceptible to orientation-dependent deformation, cracking and subsurface damage during precision machining. Molecular dynamics simulations, nanoindentation experiments, focused ion beam (FIB) cross-sectioning and cross-sectional transmission electron microscopy (XTEM) were combined to investigate indentation-induced deformation and damage in sulfur-doped InP wafers with (100), (110) and (111) orientations. Crystallographic orientation strongly affected plasticity initiation, defect evolution and crack propagation. The (100) plane showed early plastic activation, extensive multi-slip activity, dense interconnected dislocation networks and the greatest measured longitudinal crack penetration of 19.50 μm. The (110) plane exhibited more localised deformation and the shallowest penetration depth of 14.03 μm, although interacting transverse cracks produced pronounced surface spalling. The (111) plane showed delayed defect nucleation, the highest hardness and the greatest elastic recovery (24.82%), but developed long radial cracks and a penetration depth of 15.27 μm, together with deeper defect propagation and localised lattice rotation. HRTEM and diffraction analyses further revealed orientation-dependent lattice distortion and localised structural disorder near cracks. When considered together with the pop-in response, dislocation structures, strain localisation and crack morphology, maximum resolved shear stress analysis provided a qualitative crystallographic interpretation of the measured damage-depth ranking of (100) > (111) > (110). These findings show that each orientation has a distinct combination of surface and subsurface damage and provide a mechanistic basis for orientation-aware damage control during precision machining.
压痕载荷下掺硫InP晶圆的取向依赖性变形及亚表面损伤机制
硫掺杂磷化铟(InP)是一种重要的III-V化合物半导体,用于高速光电和光子器件。它的脆性和各向异性响应使其在精密加工过程中容易发生与取向相关的变形、开裂和亚表面损伤。采用分子动力学模拟、纳米压痕实验、聚焦离子束(FIB)横截面和透射电子显微镜(XTEM)相结合的方法,研究了(100)、(110)和(111)取向硫掺杂InP晶圆的压痕诱导变形和损伤。晶体取向对塑性萌生、缺陷演化和裂纹扩展有重要影响。(100)面塑性活化较早,多滑移活动广泛,位错网络密集,纵向裂纹深度最大,达到19.50 μm。(110)平面表现出更多的局部变形,最浅的穿透深度为14.03 μm,尽管相互作用的横向裂纹产生了明显的表面剥落。(111)面缺陷形核延迟,硬度最高,弹性回复率最高(24.82%),但径向裂纹较长,渗透深度为15.27 μm,缺陷扩展较深,晶格局部旋转。HRTEM和衍射分析进一步揭示了取向相关的晶格畸变和裂纹附近的局部结构紊乱。当考虑到弹出响应、位错结构、应变局部化和裂纹形态时,最大分解剪应力分析为测量的损伤深度等级(100)> (111) >(110)提供了定性的晶体学解释。这些研究结果表明,每种取向都有不同的表面和亚表面损伤组合,为精密加工中取向感知损伤控制提供了机理依据。
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来源期刊
Materials Characterization
Materials Characterization 工程技术-材料科学:表征与测试
CiteScore
7.60
自引率
8.50%
发文量
746
审稿时长
36 days
期刊介绍: Materials Characterization features original articles and state-of-the-art reviews on theoretical and practical aspects of the structure and behaviour of materials. The Journal focuses on all characterization techniques, including all forms of microscopy (light, electron, acoustic, etc.,) and analysis (especially microanalysis and surface analytical techniques). Developments in both this wide range of techniques and their application to the quantification of the microstructure of materials are essential facets of the Journal. The Journal provides the Materials Scientist/Engineer with up-to-date information on many types of materials with an underlying theme of explaining the behavior of materials using novel approaches. Materials covered by the journal include: Metals & Alloys Ceramics Nanomaterials Biomedical materials Optical materials Composites Natural Materials.
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