Coupled regulation by sintering and post-sintering heat treatment for improved current-carrying stability of ZnO varistor ceramics

IF 3.2 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Zhiyao Fu, Jiazheng Lu, Haocheng Liu, Zhuang Tang, Kai Ning
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引用次数: 0

Abstract

A processing window that simultaneously preserves nonlinear electrical properties and high-current stability is required for conventional ZnO varistor ceramics. Here, six sintering temperatures (1050–1200 °C) were evaluated using phase composition, microstructure, E–J characteristics, 2 ms square-wave loading, and 4/10 μs and repeated 8/20 μs impulse tests. The sample sintered at 1150 °C was selected by a multi-criterion assessment that prioritized impulse endurance and energy absorption while maintaining acceptable voltage gradient, leakage-current density, nonlinear coefficient, and relative density. Post-sintering treatment was then mapped independently over 425–725 °C and cooling rates of 5–90 °C/h. Treatment at 525 °C for 2 h followed by cooling at 15 °C/h produced the smallest measured E1mA variation (4.43%) after two 100 kA, 4/10 μs impulses. XRD, SEM, temperature-dependent conductivity, and dielectric-relaxation analyses show that changes in the bismuth-rich grain-boundary phase state are accompanied by systematic variations in the apparent grain-boundary barrier, relaxation response, and impulse stability. The resulting processing-stability map provides a practical basis for optimizing conventionally sintered ZnO varistors for high-current service.

烧结与烧结后热处理耦合调节提高ZnO压敏陶瓷载流稳定性
传统ZnO压敏电阻陶瓷需要同时保持非线性电学特性和高电流稳定性的加工窗口。通过相组成、微观结构、E-J特性、2 ms方波加载、4/10 μs和重复8/20 μs脉冲测试,对6种烧结温度(1050-1200°C)进行了评价。在1150°C下烧结的样品通过多标准评估选择,优先考虑脉冲耐力和能量吸收,同时保持可接受的电压梯度、漏电流密度、非线性系数和相对密度。然后在425-725°C和5-90°C/h的冷却速率下独立绘制烧结后处理。在525°C下处理2 h,然后在15°C/h下冷却,经过两次100 kA, 4/10 μs脉冲后,测量到的E1mA变化最小(4.43%)。XRD、SEM、电导率和介电弛豫分析表明,富铋晶界相态的变化伴随着晶界势垒、弛豫响应和脉冲稳定性的系统变化。所得的工艺稳定性图为优化高电流条件下的传统烧结ZnO压敏电阻器提供了实用依据。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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