Zhiyao Fu, Jiazheng Lu, Haocheng Liu, Zhuang Tang, Kai Ning
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引用次数: 0
Abstract
A processing window that simultaneously preserves nonlinear electrical properties and high-current stability is required for conventional ZnO varistor ceramics. Here, six sintering temperatures (1050–1200 °C) were evaluated using phase composition, microstructure, E–J characteristics, 2 ms square-wave loading, and 4/10 μs and repeated 8/20 μs impulse tests. The sample sintered at 1150 °C was selected by a multi-criterion assessment that prioritized impulse endurance and energy absorption while maintaining acceptable voltage gradient, leakage-current density, nonlinear coefficient, and relative density. Post-sintering treatment was then mapped independently over 425–725 °C and cooling rates of 5–90 °C/h. Treatment at 525 °C for 2 h followed by cooling at 15 °C/h produced the smallest measured E1mA variation (4.43%) after two 100 kA, 4/10 μs impulses. XRD, SEM, temperature-dependent conductivity, and dielectric-relaxation analyses show that changes in the bismuth-rich grain-boundary phase state are accompanied by systematic variations in the apparent grain-boundary barrier, relaxation response, and impulse stability. The resulting processing-stability map provides a practical basis for optimizing conventionally sintered ZnO varistors for high-current service.
期刊介绍:
The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.