Pulsed Laser Deposition of Barium Titanate Thin Films for Advanced Applications

Abstract

With the rapid advancement of the Internet of Things (IoT), artificial intelligence (AI), and wearable technologies, barium titanate (BTO) thin films play a vital role as core functional layer materials. This also imposes higher demands on the crystallization quality of thin films, interface states, and compositional uniformity. Pulsed laser deposition (PLD) technology has become a key method for fabricating high-quality BTO thin films due to its advantages of precise composition control and ease of achieving in-situ epitaxial growth. This paper provides a systematic review of research progress in fabricating BTO thin films using PLD technology, focusing on the effects of key process parameters such as deposition temperature, oxygen pressure, laser energy, and repetition rate on the crystalline quality, surface morphology, and performance characteristics of the thin films. The results demonstrate that BTO thin films with high dielectric constant, low leakage current, and pronounced ferroelectric properties can be obtained by optimizing the PLD process conditions. Furthermore, this paper summarizes the application potential of BTO thin films in electro-optic modulators (EOMs), ferroelectric memristors, and sensors, while identifying current technical challenges and future development directions. This review aims to provide theoretical references and process guidance for the controllable preparation and integration of high-performance devices in BTO thin films, advancing their development in the field of functional oxide thin films.