Defect Engineering in β-Ga2O3 Schottky Barrier Diodes via Proton Irradiation and Subsequent Low-Temperature Supercritical Fluid Treatment

IF 7.8 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
ACS Applied Materials & Interfaces Pub Date : 2026-10-21 Epub Date: 2026-10-09 DOI:10.1021/acsami.6c13725
Yushan Song, Leidang Zhou, Liang Chen, Teng Ma, Zhifeng Lei, Xiao Ouyang
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引用次数: 0

Abstract

This study proposes a defect engineering strategy that combines low-fluence proton irradiation for leakage current (Jr) suppression and subsequent low-temperature supercritical fluid (SCF) treatment for forward conduction characteristic restoration in β-Ga2O3 Schottky barrier diodes (SBDs) with and without NiO guard rings. Mechanistically, the results reveal that proton irradiation and subsequent SCF treatment are not the inverse of each other, as the former primarily introduces gallium vacancies (VGa), whereas the latter mainly passivates oxygen vacancies (VO). On the one hand, for proton irradiation, the introduction of VGa reduces the net carrier concentration (ND – NA), leading to a significant decrease in Jr, accompanied by an increase in specific on-resistance (Ron,sp). On the other hand, for subsequent SCF treatment, the passivation of VO effectively enhances electron mobility rather than substantially restoring ND – NA, thereby maintaining Jr at the irradiated level and considerably reducing Ron,sp. Consequently, through the above defect modulation in bulk β-Ga2O3, SBDs simultaneously achieve a decrease in Jr from 1.16 × 10–5 to 2.01 × 10–8 A·cm–2 at –200 V, a moderate increase in Ron,sp relative to their unirradiated counterparts, and a higher on/off current ratio from 2.28 × 107 to 5.69 × 109 at –200 V. Furthermore, this strategy substantially diminishes the effectiveness of the NiO guard ring in reducing Jr. These findings highlight the potential of this defect engineering as an effective strategy for fabricating high-performance β-Ga2O3 SBDs.

质子辐照及后续低温超临界流体处理β-Ga2O3肖特基势垒二极管缺陷工程
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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