Parametric Instability of Plasma Caused by the Influence of an External High-Frequency Electric Pumping Field

IF 1.1 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
Contributions to Plasma Physics Pub Date : 2026-10-08 Epub Date: 2026-06-25 DOI:10.1002/ctpp.70152
S. I. Mammadova, L. I. Guliyeva
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引用次数: 0

Abstract

In this paper, we experimentally investigated the parametric instability of magnetized plasma caused by the action of an external high-frequency electric pumping field in the frequency range ω pi ≪ ω 0 ≪ ω pe $$ {\omega}_{pi}\ll {\omega}_0\ll {\omega}_{pe} $$ ( ω pi , ω pе $$ {\omega}_{p i},{\omega}_{p\mathit{\mathrm{e}}} $$ are the ion and electron langmuir frequencies of the plasma, ω 0 $$ {\omega}_0 $$ is the frequency of the external high-frequency electric field), which corresponds to the excitation of lower-hybrid electron and ion oscillations propagating almost across the magnetic field. It has been established that the longitudinal (along the magnetic field) limitation of the plasma volume under certain conditions is a decisive factor determining the threshold characteristics of the parametric process in the lower hybrid frequency range. The given estimates indicate the need to take this factor into account in the practical use of plasma systems based on high-frequency discharges.

外部高频电抽运场影响下等离子体的参数不稳定性
在本文中,我们通过实验研究了在ω PI≪ω 0≪ω PE频率范围内的外部高频电泵场作用下磁化等离子体的参数不稳定性$$ {\omega}_{pi}\ll {\omega}_0\ll {\omega}_{pe} $$ (ω PI, ω p_ $$ {\omega}_{p i},{\omega}_{p\mathit{\mathrm{e}}} $$为等离子体的离子和电子朗缪尔频率,ω 0 $$ {\omega}_0 $$是外部高频电场的频率),它对应于几乎穿过磁场传播的低杂化电子和离子振荡的激发。在一定条件下,等离子体体积的纵向(沿磁场方向)限制是决定低混合频率范围内参数化过程阈值特性的决定性因素。给出的估计表明,在基于高频放电的等离子体系统的实际使用中需要考虑到这一因素。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Contributions to Plasma Physics
Contributions to Plasma Physics 物理-物理:流体与等离子体
CiteScore
2.90
自引率
12.50%
发文量
110
审稿时长
4-8 weeks
期刊介绍: Aims and Scope of Contributions to Plasma Physics: Basic physics of low-temperature plasmas; Strongly correlated non-ideal plasmas; Dusty Plasmas; Plasma discharges - microplasmas, reactive, and atmospheric pressure plasmas; Plasma diagnostics; Plasma-surface interaction; Plasma technology; Plasma medicine.
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