Equivalent Regulation Mechanism of Electron Density Distribution in Vacuum Arcs by Transverse Magnetic Fields and Contact Gaps

IF 3.3 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Chongyang Huang;Jishi Yan;Si Fu;Hanwen Du;Zhengbo Li;Feiran Zhang
{"title":"Equivalent Regulation Mechanism of Electron Density Distribution in Vacuum Arcs by Transverse Magnetic Fields and Contact Gaps","authors":"Chongyang Huang;Jishi Yan;Si Fu;Hanwen Du;Zhengbo Li;Feiran Zhang","doi":"10.1109/TDEI.2025.3636110","DOIUrl":null,"url":null,"abstract":"Taking single-break dc vacuum circuit breakers as the research object, an experimental platform for collecting characteristic information of dc vacuum arcs was established. High-speed cameras were used to capture images of the zero-zone process of vacuum arcs under transverse magnetic fields (TMFs), flat contacts, and different commutation gaps. Spectrometers were employed to collect characteristic spectral lines at Cu I 521.8 nm, from which electron temperature and electron density were calculated and analyzed. The study found that under the same operating condition with a commutation gap of 6 mm, the swastika-shaped TMF contacts can effectively regulate the spatial distribution of arc plasma. Compared with the case without magnetic field, the radial distribution uniformity of electron density is significantly improved, and the ratio of electron density between the center and the edge on the cathode contact surface decreases from 7:1 to 1.6:1. Increasing the contact gap can improve the spatial distribution uniformity of electron density. The TMF gap (6 mm) and increasing the contact gap (10 mm) under no magnetic field conditions have equivalent regulatory effects on the radial/axial distribution of electron density. Both increasing the gap and enhancing the magnetic field improve the uniformity of plasma spatial distribution and reduce the difference in electron density between the center and edge of the contact surface. The TMF can equivalently replace increasing the gap to achieve stable arc control.","PeriodicalId":13247,"journal":{"name":"IEEE Transactions on Dielectrics and Electrical Insulation","volume":"33 5","pages":"3517-3526"},"PeriodicalIF":3.3000,"publicationDate":"2026-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Dielectrics and Electrical Insulation","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/11263927/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2025/11/21 0:00:00","PubModel":"Epub","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

Taking single-break dc vacuum circuit breakers as the research object, an experimental platform for collecting characteristic information of dc vacuum arcs was established. High-speed cameras were used to capture images of the zero-zone process of vacuum arcs under transverse magnetic fields (TMFs), flat contacts, and different commutation gaps. Spectrometers were employed to collect characteristic spectral lines at Cu I 521.8 nm, from which electron temperature and electron density were calculated and analyzed. The study found that under the same operating condition with a commutation gap of 6 mm, the swastika-shaped TMF contacts can effectively regulate the spatial distribution of arc plasma. Compared with the case without magnetic field, the radial distribution uniformity of electron density is significantly improved, and the ratio of electron density between the center and the edge on the cathode contact surface decreases from 7:1 to 1.6:1. Increasing the contact gap can improve the spatial distribution uniformity of electron density. The TMF gap (6 mm) and increasing the contact gap (10 mm) under no magnetic field conditions have equivalent regulatory effects on the radial/axial distribution of electron density. Both increasing the gap and enhancing the magnetic field improve the uniformity of plasma spatial distribution and reduce the difference in electron density between the center and edge of the contact surface. The TMF can equivalently replace increasing the gap to achieve stable arc control.
横向磁场和接触间隙对真空电弧中电子密度分布的等效调节机制
以单开直流真空断路器为研究对象,建立了直流真空电弧特征信息采集实验平台。利用高速摄像机拍摄了真空电弧在横向磁场、平面触点和不同换相间隙下的零区过程。利用光谱仪采集Cu I 521.8 nm处的特征光谱线,计算并分析其电子温度和电子密度。研究发现,在换向间隙为6 mm的相同工作条件下,万字形TMF触点可以有效调节电弧等离子体的空间分布。与无磁场情况相比,电子密度径向分布均匀性显著提高,阴极接触面中心与边缘的电子密度比由7:1降至1.6:1。增大接触间隙可以提高电子密度的空间分布均匀性。在无磁场条件下,增大TMF间隙(6 mm)和增大接触间隙(10 mm)对电子密度的径向/轴向分布具有等效的调节作用。增大间隙和增强磁场都提高了等离子体空间分布的均匀性,减小了接触表面中心和边缘之间的电子密度差。TMF可以等效地代替增大间隙来实现稳定的电弧控制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
IEEE Transactions on Dielectrics and Electrical Insulation
IEEE Transactions on Dielectrics and Electrical Insulation 工程技术-工程:电子与电气
CiteScore
6.00
自引率
22.60%
发文量
309
审稿时长
5.2 months
期刊介绍: Topics that are concerned with dielectric phenomena and measurements, with development and characterization of gaseous, vacuum, liquid and solid electrical insulating materials and systems; and with utilization of these materials in circuits and systems under condition of use.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信
小红书