The Impact of Crystal Phase on Rectification Properties of TaSi2P4–WSi2P4 Lateral Heterojunctions

IF 4.4 2区 化学 Q2 CHEMISTRY, MULTIDISCIPLINARY
Langmuir Pub Date : 2026-10-20 Epub Date: 2026-10-06 DOI:10.1021/acs.langmuir.6c03943
Yu-Hao Guo, Wei-Kang Zhang, Chuan-Kui Wang, Xiao-Xiao Fu
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引用次数: 0

Abstract

The Schottky barrier height is generally regarded as the main factor affecting the rectifying performance of two-dimensional Schottky diodes. However, the crystal phase of the component two-dimensional materials also exerts a significant influence on the electrical properties of the diodes, and the underlying mechanism remains unclear. Based on the first-principles calculations, we take the lateral heterojunctions consisting of metallic TaSi2P4 and semiconducting WSi2P4 with well-matched lattice constants and different crystal phases as examples to reveal the impact of the crystal phase on the rectification properties. Combined investigations on material work functions, electrostatic difference potential, and interfacial charge transfer verify the emergence of n-type Schottky contact in TaSi2P4–WSi2P4 heterostructures. A remarkable rectifying behavior can be observed from the volt–ampere characteristic curves of the Schottky diodes. The heterojunction diode composed of TaSi2P4 and WSi2P4 with different crystal phases and large bandgap exhibits the lowest current and the highest rectification ratio (RR) (above 104). Here, the crystal phase of the component materials exerts an important impact on the electrical performance of the diodes, via tuning the bandgap, work function, and interfacial configuration. Increasing the semiconductor layer length within the heterojunction system effectively enhances the rectification performance, since the current asymmetry under forward and reverse bias is increased as the semiconductor length expands. A respectable RR of near 105 is achieved in the heterojunction diode at low bias voltages by merely altering the central transition metal atomic layer within the septuple-atomic-layer materials. It may be promising to realize by lateral epitaxial growth of the heterojunction than those systems containing multiple distinct atomic layers in a septuple-atomic-layer structure. These calculations provide an insightful understanding of the influence factors on the rectification properties of lateral heterojunctions and also provide a guideline for the design of high-performance rectifiers.

晶体相位对TaSi2P4-WSi2P4横向异质结整流性能的影响
肖特基势垒高度通常被认为是影响二维肖特基二极管整流性能的主要因素。然而,组件二维材料的晶相对二极管的电性能也有显著的影响,其潜在的机制尚不清楚。基于第一性原理计算,我们以晶格常数匹配良好、晶相不同的金属TaSi2P4和半导体WSi2P4组成的横向异质结为例,揭示了晶相对整流性能的影响。通过对材料功函数、静电差电位和界面电荷转移的综合研究,验证了TaSi2P4-WSi2P4异质结构中存在n型肖特基接触。从肖特基二极管的伏安特性曲线可以观察到一个显著的整流行为。不同晶相、大带隙的TaSi2P4和WSi2P4组成的异质结二极管具有最低的电流和最高的整流比(RR)(> 104)。在这里,组件材料的晶体相位通过调节带隙、功函数和界面配置对二极管的电性能产生重要影响。增加异质结系统内的半导体层长度可以有效地提高整流性能,因为正向和反向偏置下的电流不对称性随着半导体长度的增加而增加。在低偏置电压下,仅通过改变七原子层材料中的中心过渡金属原子层,就可以在异质结二极管中获得接近105的可观的RR。相对于在七原子层结构中包含多个不同原子层的异质结系统,它可能更有希望通过横向外延生长实现。这些计算有助于深入了解影响横向异质结整流特性的因素,并为高性能整流器件的设计提供指导。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Langmuir
Langmuir 化学-材料科学:综合
CiteScore
6.50
自引率
10.30%
发文量
1464
审稿时长
2.1 months
期刊介绍: Langmuir is an interdisciplinary journal publishing articles in the following subject categories: Colloids: surfactants and self-assembly, dispersions, emulsions, foams Interfaces: adsorption, reactions, films, forces Biological Interfaces: biocolloids, biomolecular and biomimetic materials Materials: nano- and mesostructured materials, polymers, gels, liquid crystals Electrochemistry: interfacial charge transfer, charge transport, electrocatalysis, electrokinetic phenomena, bioelectrochemistry Devices and Applications: sensors, fluidics, patterning, catalysis, photonic crystals However, when high-impact, original work is submitted that does not fit within the above categories, decisions to accept or decline such papers will be based on one criteria: What Would Irving Do? Langmuir ranks #2 in citations out of 136 journals in the category of Physical Chemistry with 113,157 total citations. The journal received an Impact Factor of 4.384*. This journal is also indexed in the categories of Materials Science (ranked #1) and Multidisciplinary Chemistry (ranked #5).
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