Thickness-driven evolution of optical transitions and dielectric function in few-layer MoS2

IF 3.8 2区 物理与天体物理 Q2 PHYSICS, APPLIED
Premlata Yadav,Budhi Singh,Chandrabhan Dohare,Nayana Devaraj,Varun Gupta,Kartick Tarafder,Subhasis Ghosh
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Abstract

MoS2 film thickness strongly influences light absorption and interaction, impacting its performance in layered optoelectronic devices. Earlier studies have mostly examined the optical features, dielectric response, and electronic structure separately, especially for large-area films grown by chemical vapor deposition (CVD). Here, we bring these together and follow how they evolve as CVD-grown MoS2 changes from bilayer to bulk-like thickness (1.32–5.14 nm), using UV–visible absorption, Raman spectroscopy, spectroscopic ellipsometry, and first-principles calculations. We resolve six optical transitions (A–F) between 1.7 and 5.5 eV. The A and B excitons come from spin–orbit-split valence bands at the K/K′ valleys, while the higher-energy C–F transitions arise from band-nesting and interband processes at several critical points. As the films thicken, the transitions broaden and shift, reflecting stronger interlayer coupling and dielectric screening, and the Raman mode separation tracks changes in the optical bandgap. Our calculations reproduce the overall ordering and thickness trends of the measured transitions and identify their origin in the band structure.
薄层二硫化钼中光学跃迁和介电函数的厚度驱动演化
二硫化钼薄膜厚度对光吸收和相互作用有很大影响,影响其在层状光电器件中的性能。早期的研究主要是分别考察光学特性、介电响应和电子结构,特别是对化学气相沉积(CVD)生长的大面积薄膜。在这里,我们将这些结合在一起,并使用紫外-可见吸收,拉曼光谱,光谱椭偏和第一性原理计算,跟踪它们如何随着cvd生长的MoS2从双层到块状厚度(1.32-5.14 nm)的变化而演变。我们解析了在1.7和5.5 eV之间的6个光学跃迁(A-F)。A和B激子来自K/K′谷的自旋轨道分裂价带,而高能C-F跃迁来自几个临界点的带嵌套和带间过程。随着薄膜变厚,跃迁变宽和移位,反映了更强的层间耦合和介电屏蔽,拉曼模式分离跟踪了光学带隙的变化。我们的计算再现了所测跃迁的总体顺序和厚度趋势,并确定了它们在能带结构中的起源。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Applied Physics Letters
Applied Physics Letters 物理-物理:应用
CiteScore
6.40
自引率
10.00%
发文量
1821
审稿时长
1.6 months
期刊介绍: Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.
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