{"title":"Thickness-driven evolution of optical transitions and dielectric function in few-layer MoS2","authors":"Premlata Yadav,Budhi Singh,Chandrabhan Dohare,Nayana Devaraj,Varun Gupta,Kartick Tarafder,Subhasis Ghosh","doi":"10.1063/5.0354897","DOIUrl":null,"url":null,"abstract":"MoS2 film thickness strongly influences light absorption and interaction, impacting its performance in layered optoelectronic devices. Earlier studies have mostly examined the optical features, dielectric response, and electronic structure separately, especially for large-area films grown by chemical vapor deposition (CVD). Here, we bring these together and follow how they evolve as CVD-grown MoS2 changes from bilayer to bulk-like thickness (1.32–5.14 nm), using UV–visible absorption, Raman spectroscopy, spectroscopic ellipsometry, and first-principles calculations. We resolve six optical transitions (A–F) between 1.7 and 5.5 eV. The A and B excitons come from spin–orbit-split valence bands at the K/K′ valleys, while the higher-energy C–F transitions arise from band-nesting and interband processes at several critical points. As the films thicken, the transitions broaden and shift, reflecting stronger interlayer coupling and dielectric screening, and the Raman mode separation tracks changes in the optical bandgap. Our calculations reproduce the overall ordering and thickness trends of the measured transitions and identify their origin in the band structure.","PeriodicalId":8094,"journal":{"name":"Applied Physics Letters","volume":"7 1","pages":""},"PeriodicalIF":3.8000,"publicationDate":"2026-10-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Physics Letters","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1063/5.0354897","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
引用次数: 0
Abstract
MoS2 film thickness strongly influences light absorption and interaction, impacting its performance in layered optoelectronic devices. Earlier studies have mostly examined the optical features, dielectric response, and electronic structure separately, especially for large-area films grown by chemical vapor deposition (CVD). Here, we bring these together and follow how they evolve as CVD-grown MoS2 changes from bilayer to bulk-like thickness (1.32–5.14 nm), using UV–visible absorption, Raman spectroscopy, spectroscopic ellipsometry, and first-principles calculations. We resolve six optical transitions (A–F) between 1.7 and 5.5 eV. The A and B excitons come from spin–orbit-split valence bands at the K/K′ valleys, while the higher-energy C–F transitions arise from band-nesting and interband processes at several critical points. As the films thicken, the transitions broaden and shift, reflecting stronger interlayer coupling and dielectric screening, and the Raman mode separation tracks changes in the optical bandgap. Our calculations reproduce the overall ordering and thickness trends of the measured transitions and identify their origin in the band structure.
期刊介绍:
Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology.
In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics.
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Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.