{"title":"An OES-feedback-controlled HiPIMS approach for controlling the deposition of (AlCrTiVZr)1-xNx high-entropy nitride coatings","authors":"Yue Wang, Weihao Jiang, Chengcan Li, Yuanbo Li, Yuan Xia, Guodong Li, Yi Xu","doi":"10.1016/j.apsusc.2026.168469","DOIUrl":null,"url":null,"abstract":"A closed-loop deposition system based on high power impulse magnetron sputtering (HiPIMS) combined with optical emission spectroscopy (OES) feedback control is proposed for the synthesis of (AlCrTiVZr)<ce:inf loc=\"post\">1-x</ce:inf>N<ce:inf loc=\"post\">x</ce:inf> coatings. To control the plasma state, the OES feedback control system adjusts the N<ce:inf loc=\"post\">2</ce:inf> flow rate in real time, stabilizing the Cr optical emission intensity (520.8 nm) at setpoints (20%-60%) defined by relative Cr optical emission intensity based on hysteresis. Decreasing the OES setpoint increases discharge current and substrate bias current, commonly enhancing plasma density and the ion bombardment characteristic of HiPIMS. The coatings exhibit compositional stability along the growth direction, reaching an overstoichiometric state at 20% setpoint with a deposition rate of 40.1 nm/min. The microstructure evolves from a fully amorphous structure (100–40% setpoints) to a self-organized bilayer structure (30–20%), which consists of an amorphous bottom layer and a top nanocrystalline/amorphous nanocomposite layer, with the nanocrystalline phase exhibiting a single NaCl-type FCC structure. Furthermore, reducing the setpoint from 30% to 20% thickens the top layer, increases crystallinity, and promotes grain growth from 2.9 nm to 5.5 nm. Meanwhile, the hardness and toughness show significant improvement as the setpoint decreases, peaking at 36.2 GPa (H) and 0.113 (H/E) at the setpoint of 20%.","PeriodicalId":247,"journal":{"name":"Applied Surface Science","volume":"34 1","pages":"168469"},"PeriodicalIF":6.6000,"publicationDate":"2026-09-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Surface Science","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1016/j.apsusc.2026.168469","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0
Abstract
A closed-loop deposition system based on high power impulse magnetron sputtering (HiPIMS) combined with optical emission spectroscopy (OES) feedback control is proposed for the synthesis of (AlCrTiVZr)1-xNx coatings. To control the plasma state, the OES feedback control system adjusts the N2 flow rate in real time, stabilizing the Cr optical emission intensity (520.8 nm) at setpoints (20%-60%) defined by relative Cr optical emission intensity based on hysteresis. Decreasing the OES setpoint increases discharge current and substrate bias current, commonly enhancing plasma density and the ion bombardment characteristic of HiPIMS. The coatings exhibit compositional stability along the growth direction, reaching an overstoichiometric state at 20% setpoint with a deposition rate of 40.1 nm/min. The microstructure evolves from a fully amorphous structure (100–40% setpoints) to a self-organized bilayer structure (30–20%), which consists of an amorphous bottom layer and a top nanocrystalline/amorphous nanocomposite layer, with the nanocrystalline phase exhibiting a single NaCl-type FCC structure. Furthermore, reducing the setpoint from 30% to 20% thickens the top layer, increases crystallinity, and promotes grain growth from 2.9 nm to 5.5 nm. Meanwhile, the hardness and toughness show significant improvement as the setpoint decreases, peaking at 36.2 GPa (H) and 0.113 (H/E) at the setpoint of 20%.
期刊介绍:
Applied Surface Science covers topics contributing to a better understanding of surfaces, interfaces, nanostructures and their applications. The journal is concerned with scientific research on the atomic and molecular level of material properties determined with specific surface analytical techniques and/or computational methods, as well as the processing of such structures.