Neutron-Induced Defect-Driven Degradation of Ferroelectric Memory and Neuromorphic Synapses in α-In2Se3 FeS-FETs

IF 4.7 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC
ACS Applied Electronic Materials Pub Date : 2026-09-22 Epub Date: 2026-09-14 DOI:10.1021/acsaelm.6c01048
Sieun Lee, Jaewook Yoo, Seokjin Oh, Hongseung Lee, Seongbin Lim, Minah Park, Seohyeon Park, Sojin Jung, Donghyeon Lee, Soohyun Lim, Dongsun Shin, Junhui Park, Bong-ki Jung, Taewan Kim, Hagyoul Bae
{"title":"Neutron-Induced Defect-Driven Degradation of Ferroelectric Memory and Neuromorphic Synapses in α-In2Se3 FeS-FETs","authors":"Sieun Lee,&nbsp;Jaewook Yoo,&nbsp;Seokjin Oh,&nbsp;Hongseung Lee,&nbsp;Seongbin Lim,&nbsp;Minah Park,&nbsp;Seohyeon Park,&nbsp;Sojin Jung,&nbsp;Donghyeon Lee,&nbsp;Soohyun Lim,&nbsp;Dongsun Shin,&nbsp;Junhui Park,&nbsp;Bong-ki Jung,&nbsp;Taewan Kim,&nbsp;Hagyoul Bae","doi":"10.1021/acsaelm.6c01048","DOIUrl":null,"url":null,"abstract":"<p>Reliable ferroelectric semiconductor devices are essential for memory and neuromorphic technologies; however, neutron-induced degradation pathways remain unclear. Here, we establish an integrated experimental framework, linking defect characterization with device-level electrical and synaptic evaluations to investigate neutron irradiation effects on α-In<sub>2</sub>Se<sub>3</sub> ferroelectric semiconductor field-effect transistors (FeS-FETs). After neutron irradiation, energy-dispersive spectroscopy (EDS) reveals irradiation-induced compositional changes, while electrical analysis indicates an increased acceptor-like trap density (<em>D</em><sub>A</sub>(E)). These defect-related trap states disrupt polarization-dependent charge transport, leading to a substantial drain current reduction (∼88.95%), and degrade the memory-window-to-sweep-range ratio (MW/SR) (∼48.20%) and endurance characteristics. Synaptic functionality is also impaired, with increased nonlinearity and reduced dynamic range, which propagate to array-level synaptic weight uncertainty and degrade neural network inference accuracy. Overall, our results suggest that defect-related trap states are a key contributor to neutron-induced degradation in α-In<sub>2</sub>Se<sub>3</sub> FeS-FETs. By clarifying this degradation pathway, this work provides insight into defect-related degradation mechanisms that may guide the future design of radiation-resilient ferroelectric memory and neuromorphic electronics.</p>","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":"8 18","pages":"7780–7789"},"PeriodicalIF":4.7000,"publicationDate":"2026-09-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Electronic Materials","FirstCategoryId":"88","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acsaelm.6c01048","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2026/9/14 0:00:00","PubModel":"Epub","JCR":"Q1","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

Reliable ferroelectric semiconductor devices are essential for memory and neuromorphic technologies; however, neutron-induced degradation pathways remain unclear. Here, we establish an integrated experimental framework, linking defect characterization with device-level electrical and synaptic evaluations to investigate neutron irradiation effects on α-In2Se3 ferroelectric semiconductor field-effect transistors (FeS-FETs). After neutron irradiation, energy-dispersive spectroscopy (EDS) reveals irradiation-induced compositional changes, while electrical analysis indicates an increased acceptor-like trap density (DA(E)). These defect-related trap states disrupt polarization-dependent charge transport, leading to a substantial drain current reduction (∼88.95%), and degrade the memory-window-to-sweep-range ratio (MW/SR) (∼48.20%) and endurance characteristics. Synaptic functionality is also impaired, with increased nonlinearity and reduced dynamic range, which propagate to array-level synaptic weight uncertainty and degrade neural network inference accuracy. Overall, our results suggest that defect-related trap states are a key contributor to neutron-induced degradation in α-In2Se3 FeS-FETs. By clarifying this degradation pathway, this work provides insight into defect-related degradation mechanisms that may guide the future design of radiation-resilient ferroelectric memory and neuromorphic electronics.

中子诱导缺陷驱动α-In2Se3 fes - fet中铁电记忆和神经形态突触的退化
可靠的铁电半导体器件对于记忆和神经形态技术至关重要;然而,中子诱导的降解途径仍不清楚。在这里,我们建立了一个集成的实验框架,将缺陷表征与器件级电学和突触评价联系起来,研究中子辐照对α-In2Se3铁电半导体场效应晶体管(fes - fet)的影响。中子辐照后,能量色散光谱(EDS)显示辐照引起的成分变化,而电学分析表明受体样陷阱密度(DA(E))增加。这些缺陷相关的阱态破坏了依赖极化的电荷输运,导致漏极电流大幅降低(~ 88.95%),并降低了记忆窗口-扫描范围比(MW/SR)(~ 48.20%)和续航特性。突触功能也会受损,非线性增加,动态范围减小,这会传播到阵列级突触权重的不确定性,降低神经网络的推理精度。总的来说,我们的研究结果表明,缺陷相关的陷阱状态是中子诱导α-In2Se3 fes - fet降解的关键因素。通过澄清这一降解途径,这项工作为缺陷相关的降解机制提供了见解,这可能指导未来设计辐射弹性铁电存储器和神经形态电子学。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
7.20
自引率
4.30%
发文量
567
期刊介绍: ACS Applied Electronic Materials is an interdisciplinary journal publishing original research covering all aspects of electronic materials. The journal is devoted to reports of new and original experimental and theoretical research of an applied nature that integrate knowledge in the areas of materials science, engineering, optics, physics, and chemistry into important applications of electronic materials. Sample research topics that span the journal's scope are inorganic, organic, ionic and polymeric materials with properties that include conducting, semiconducting, superconducting, insulating, dielectric, magnetic, optoelectronic, piezoelectric, ferroelectric and thermoelectric. Indexed/​Abstracted: Web of Science SCIE Scopus CAS INSPEC Portico
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