Leaching Behaviour of Stereolithography 3D-printed Microfluidics

IF 6.3 2区 工程技术 Q1 BIOCHEMICAL RESEARCH METHODS
Lab on a Chip Pub Date : 2026-09-09 DOI:10.1039/d6lc00336b
Volkan Cirik,Lívia Kanizsová,Olga Kockova,Nicholas Lynn
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引用次数: 0

Abstract

Stereolithography (SLA) 3D printing has become a standard tool to produce microfluidic structures, thanks to advancements in both 3D printer technology and resin materials. Used across many applications, SLA-printed microfluidics are often exposed to a variety of solvents, giving rise to potential leaching from the printed structure (in the form of unreacted resin components) that can potentially interfere with device functionality. In this study, we investigated the leaching behavior of SLA-printed structures from both external surfaces (under static conditions) and microfluidic surfaces (under flowing conditions). We focused on how leaching is affected by factors such as resin and solvent type, postprocessing, fluidic architecture, and internal flow rates. Using a combination of Gas Chromatography-Mass Spectrometry (GC-MS) and High-Performance Liquid Chromatography (HPLC) analysis, we identified 15 chemical species consistently found in leachate samples from 4 commercial resins, in the form of monomers and photoinitiators. We found that increased post-processing led to an overall reduction in leaching, with monomers being more affected than photoinitiators. In no cases was leaching eliminated. For leaching from microfluidic channels, we found that light treatment did not result in any reduction in leachate levels, which can be attributed to the absorption of light in the external regions of the structure. These findings highlight the importance of thorough post-processing, careful solvent selection, and optimal fluid flow conditions to improve the chemical stability and biocompatibility of SLA-printed devices in fluidic applications.
立体光刻3d打印微流体的浸出行为
由于3D打印机技术和树脂材料的进步,立体光刻(SLA) 3D打印已经成为生产微流体结构的标准工具。在许多应用中,sla打印的微流体经常暴露于各种溶剂中,从而导致印刷结构(以未反应的树脂成分的形式)的潜在浸出,这可能会干扰设备的功能。在这项研究中,我们研究了sla打印结构在外部表面(静态条件下)和微流体表面(流动条件下)的浸出行为。我们关注的是浸出如何受到树脂和溶剂类型、后处理、流体结构和内部流速等因素的影响。采用气相色谱-质谱(GC-MS)和高效液相色谱(HPLC)相结合的分析方法,我们确定了在4种商业树脂的渗滤液样品中以单体和光引发剂的形式一致存在的15种化学物质。我们发现增加后处理导致浸出总体减少,单体比光引发剂受影响更大。在任何情况下,浸出都没有被消除。对于微流控通道的浸出,我们发现光处理并没有导致渗滤液水平的任何减少,这可以归因于结构外部区域对光的吸收。这些发现强调了彻底的后处理,仔细的溶剂选择和最佳的流体流动条件对于提高流体应用中sla打印器件的化学稳定性和生物相容性的重要性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Lab on a Chip
Lab on a Chip 工程技术-化学综合
CiteScore
11.10
自引率
8.20%
发文量
434
审稿时长
2.6 months
期刊介绍: Lab on a Chip is the premiere journal that publishes cutting-edge research in the field of miniaturization. By their very nature, microfluidic/nanofluidic/miniaturized systems are at the intersection of disciplines, spanning fundamental research to high-end application, which is reflected by the broad readership of the journal. Lab on a Chip publishes two types of papers on original research: full-length research papers and communications. Papers should demonstrate innovations, which can come from technical advancements or applications addressing pressing needs in globally important areas. The journal also publishes Comments, Reviews, and Perspectives.
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