Analysis of stress distribution around conventional and basal dental implants in the posterior mandible: A finite element study.

Q2 Dentistry
Gayathri N Meikandan, D Jayachandran, G Jayaprakash, R Saranyan, Priya Kesavan, V M Deepa
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引用次数: 0

Abstract

Background: Dental implants have become a widely accepted solution for the replacement of missing teeth, offering functional and esthetic benefits. The long-term success of dental implants largely depends on the distribution of stresses in the surrounding bone, as excessive stress can lead to bone resorption and implant failure. Finite element analysis (FEA) is a powerful tool that allows for the simulation of mechanical behavior under functional loading, providing insights into stress patterns and implant performance in various anatomical and prosthetic configurations.

Aim: The aim of the study was to analyze stress distribution around conventional and basal dental implants placed in the posterior region of the mandible using FEA.

Materials and methods: The finite element model simulated a partially edentulous posterior mandibular segment where the mandibular second premolar and first molar were missing. Two dental implants were placed in the posterior mandible to simulate clinical rehabilitation of this region. Three-dimensional models were developed using cone beam computed tomography scans, and FEA was performed with ANSYS Workbench 18.1. Two models were analyzed: Model 1: conventional implant (4.1 mm × 8 mm) in 10-mm residual bone height and Model 2: basal implant (3.5 mm × 16 mm) in 8-mm residual bone height. Stress distribution was assessed under masticatory loading conditions to evaluate implant stability and stress accumulation in surrounding bone structures.

Results: The study was designed as a comparative FEA evaluating stress distribution between conventional and basal implant systems placed in the posterior mandible under identical loading conditions. Model 2 (basal implant) exhibited greater deflection (13 μm), which may compromise implant stability. Model 1 (conventional implant) demonstrated higher stress accumulation in the cortical bone (34.71 MPa).

Conclusion: The present FEA demonstrates that although basal implants showed slightly lower crestal bone stress, the increased deformation observed may influence long-term biomechanical stability under functional loading conditions. Hence, Model 1 (conventional implant) is the preferred choice for clinical applications, offering better stability and longevity compared to Model 2.

后下颌常规种植体与基牙种植体周围应力分布分析:有限元研究。
背景:牙种植体已成为一种广泛接受的解决方案,以替代缺失的牙齿,提供功能和美观的好处。牙种植体的长期成功很大程度上取决于周围骨的应力分布,因为过大的应力会导致骨吸收和种植体失败。有限元分析(FEA)是一种强大的工具,可以模拟功能载荷下的机械行为,提供对各种解剖和假体配置的应力模式和植入物性能的见解。目的:应用有限元分析方法分析常规种植体和基牙种植体在下颌骨后缘的应力分布。材料与方法:采用有限元模型模拟下颌第二前磨牙和第一磨牙缺失的部分无牙后牙段。在后下颌骨放置两颗牙种植体来模拟该区域的临床康复。采用锥形束计算机断层扫描建立三维模型,利用ANSYS Workbench 18.1进行有限元分析。分析两种模型:模型1:常规种植体(4.1 mm × 8 mm),残骨高度为10 mm;模型2:基础种植体(3.5 mm × 16 mm),残骨高度为8 mm。在咀嚼负荷条件下评估应力分布,以评估种植体的稳定性和周围骨结构的应力积累。结果:该研究设计为比较有限元分析,评估在相同载荷条件下放置在后下颌的传统种植体和基础种植体系统之间的应力分布。模型2(基底种植体)表现出较大的挠度(13 μm),这可能会影响种植体的稳定性。模型1(常规种植体)表现出较高的骨皮质应力积累(34.71 MPa)。结论:目前的有限元分析表明,尽管基底种植体显示出稍低的嵴骨应力,但观察到的变形增加可能会影响功能载荷条件下的长期生物力学稳定性。因此,与模型2相比,模型1(传统种植体)具有更好的稳定性和使用寿命,是临床应用的首选。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
1.70
自引率
0.00%
发文量
87
审稿时长
44 weeks
期刊介绍: The Journal of Indian Society of Periodontology publishes original scientific articles to support practice , education and research in the dental specialty of periodontology and oral implantology. Journal of Indian Society of Periodontology (JISP), is the official publication of the Society and is managed and brought out by the Editor of the society. The journal is published Bimonthly with special issues being brought out for specific occasions. The ISP had a bulletin as its publication for a large number of years and was enhanced as a Journal a few years ago
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