Activating N-site for CO electroreduction via Cu doping in WSi2N4

IF 6.6 2区材料科学 Q2 CHEMISTRY, PHYSICAL

Applied Surface Science Pub Date : 2026-08-14 DOI:10.1016/j.apsusc.2026.168121

Kai Yuan, Tianyue Tong, Yaoyao Linghu, Shaohui Guo

引用次数: 0

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WSi2N4中Cu掺杂活化CO电还原n位

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Applied Surface Science 工程技术-材料科学：膜

CiteScore

12.50

自引率

7.50%

发文量

3393

审稿时长

67 days

期刊介绍： Applied Surface Science covers topics contributing to a better understanding of surfaces, interfaces, nanostructures and their applications. The journal is concerned with scientific research on the atomic and molecular level of material properties determined with specific surface analytical techniques and/or computational methods, as well as the processing of such structures.