Features of the Action of a High-Power Ion Beam of Nanosecond Duration on an AlN Thin Piezoelectric Film

IF 0.4 Q4 PHYSICS, CONDENSED MATTER
V. S. Kovivchak
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Abstract

The destruction and change of elemental composition of surface layers of an AlN thin film deposited by reactive magnetron sputtering on a glass ceramic substrate (including metal sublayer) under the influence of high-power ion beam of nanosecond duration have been investigated. The spatial characteristics of the surface destruction of the film have been determined. Cracking of the film, as well as partial or complete removal of fragments of film destruction, is observed depending on the beam current density. The effect of a high-power ion beam on the systems AlN thin film‒Al thin film‒glass ceramic and Al thin film‒AlN thin film‒Al thin film‒glass ceramic was considered. The formation of aluminum droplets on the surface of glass ceramic in the areas of the removed Al film, as well as on the surface of fragments of AlN film destruction at a single irradiation with a high-power ion beam with current density up to 150 A/cm2 was found. The depletion of the surface layer of the film by nitrogen was established. Possible mechanisms for the observed changes in the surface layer of AlN thin film are discussed.

Abstract Image

纳秒级高功率离子束对AlN压电薄膜的作用特性
研究了在纳秒级强离子束作用下,反应磁控溅射沉积在玻璃陶瓷衬底(含金属亚层)上的氮化铝薄膜的破坏和表层元素组成的变化。确定了薄膜表面破坏的空间特征。根据光束电流密度,观察到薄膜的开裂,以及部分或完全去除薄膜破坏的碎片。研究了高功率离子束对AlN薄膜- Al薄膜-玻璃陶瓷和Al薄膜- AlN薄膜- Al薄膜-玻璃陶瓷的影响。在高功率离子束单次辐照下,在去除铝膜的区域内,在玻璃陶瓷表面形成铝滴,并在破坏铝膜的碎片表面形成铝滴。确定了氮对膜表层的损耗。讨论了氮化铝薄膜表面变化的可能机制。
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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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